Array substrate, manufacturing method of array substrate and display device

Abstract

The invention relates to the technical field of display, in particular to an array substrate, a manufacturing method of the array substrate and a display device. The array substrate comprises a first gate metal layer, a first gate insulating layer on the first gate metal layer, an active layer which is arranged on the first gate insulating layer and corresponds to the first gate metal layer, an etching barrier layer on the active layer, a source and drain metal layer comprising a source and a drain, a second gate insulating layer on the source and drain metal layer and a second gate metal layer on the second gate insulating layer, wherein the source and the drain are in contact with the two sides of the active layer respectively and are separated on the etching barrier layer. By means of the array substrate, the manufacturing method of the array substrate and the display device, the TFT characteristic can be optimized, the gate line resistance can be reduced, light irradiating the active layer can be shielded, IR Drop and TFT threshold voltage excursion and generation of the light leakage current of the active layer can be easily restrained, and the performance of the display device can be promoted.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to an array substrate, a manufacturing method thereof, and a display device. Background technique [0002] In recent years, Organic Light Emitting Diode (OLED) has become a very popular emerging flat-panel display product at home and abroad, because OLED display has self-illumination, wide viewing angle, short response time, high luminous efficiency, wide color gamut, low It has the characteristics of working voltage, thin panel, large-size and flexible panel and simple manufacturing process, and it also has the potential to further develop to low cost. [0003] However, in large-scale display applications, since there is a certain resistance in the backplane power supply line, and the driving current of all pixels is provided by the unit power supply line ARVDD, the power supply voltage in the area close to the ARVDD power supply position in the backplane is relatively far...

AI Technical Summary

Problems solved by technology

However, the active layer in the thin film transistor (Thin Film Transistor, TFT) on the AMOLED (Active Matrix Organic Light Emitting Diode, active matrix organic light emitting diode) substrate will experience a threshold voltage shift under the irradiation of these lights, affecting Improve the uniformity of the display screen and i...

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