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Adaptive photomask and method of use thereof

A photomask and self-adaptive technology, applied in the field of photomask and photomasking technology, can solve problems such as boundary mismatch

Active Publication Date: 2020-12-15
APPLE INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But in conventional photomasking techniques, the pattern printed on the photomask is fixed and does not tolerate any specification variance of said features due to manufacturing tolerances
This may ultimately result in parts whose pattern of treated and untreated segments on the surface does not match the boundaries of the surface features

Method used

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  • Adaptive photomask and method of use thereof
  • Adaptive photomask and method of use thereof
  • Adaptive photomask and method of use thereof

Examples

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Embodiment Construction

[0017] The following disclosure describes various embodiments of photomasks and methods of using photomasks. Specific embodiments are set forth in the following description and drawings to provide a thorough understanding of various embodiments of the inventive technology. Furthermore, the various features, structures and / or characteristics of the techniques of the present invention may be combined in other suitable structures and environments. Furthermore, well-known structures, materials, operations and / or systems are not shown or described in detail in the following disclosure to avoid unnecessarily obscuring the description of the various embodiments of the inventive technology. One skilled in the art will recognize, however, that the techniques of the present invention may be practiced without one or more of the details set forth herein, or with other structures, methods, components, and the like.

[0018] Embodiments described herein relate to methods, systems, and appa...

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PUM

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Abstract

The embodiments described herein relate to methods, devices, and systems for masking a substrate using a photomasking process. An adaptive photomask configured to generate a photomasking pattern in accordance with dimensions of a surface feature on substrate is described. The adaptive photomask can be used to create customized photomask patterns for individual substrates. Methods and devices described herein can be used in manufacturing processes where similar parts having slight differences due to built-in tolerances are manufactured. Methods and a devices described herein can also be used in manufacture processes involving masking of three-dimensional portions of a part. A photomasking system that includes a translational mechanism for scanning a substrate surface is described.

Description

technical field [0001] The described embodiments relate generally to photomask and photomasking techniques used in the manufacture of consumer products. More specifically, photomask and photomasking techniques that accommodate tolerances that accumulate during the manufacturing of consumer products are described. Background technique [0002] A photomask is usually an opaque plate that has holes or clearings that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography and surface finishing processes to transfer geometric patterns of light onto light-sensitive chemical photoresists on the surface of a substrate. The substrate is then chemically treated to remove portions of the photoresist that were either exposed to light or not, depending on the type of photoresist used. The molded photoresist remaining on the surface of the substrate can then act as a mask during any surface treatment procedure such as deposition, etching, or b...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/00G03F7/20
CPCG03F1/56G03F1/22G03F1/36G03F1/50G03F7/2045G03F7/70291
Inventor N·Y·谭
Owner APPLE INC