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Photosensitive Resin Composition For Black Matrix, Black Matrix, Optical Filter And Display

A technology of photosensitive resin and black matrix, applied in the field of photosensitive resin composition, can solve the problem of low surface resistance value

Inactive Publication Date: 2015-03-18
CHI MEI CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Although the photosensitive resin composition in which the amount of black pigment is used in the prior art can increase light-shielding properties, the above-mentioned known photosensitive resin composition still has the problem of low surface resistance.

Method used

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  • Photosensitive Resin Composition For Black Matrix, Black Matrix, Optical Filter And Display
  • Photosensitive Resin Composition For Black Matrix, Black Matrix, Optical Filter And Display
  • Photosensitive Resin Composition For Black Matrix, Black Matrix, Optical Filter And Display

Examples

Experimental program
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Effect test

preparation example Construction

[0176] Preparation method of photosensitive resin composition for black matrix

[0177] The method that can be used to prepare photosensitive resin composition for black matrix is ​​for example: with alkali-soluble resin (A), compound (B) with ethylenically unsaturated group, photoinitiator (C), solvent (D), black pigment ( E), the first crosslinking agent (F) and inorganic particles (G) are placed in a stirrer and stirred to make them uniformly mixed into a solution state. Additives (H) can also be added if necessary. After uniformly mixed, you can obtain A photosensitive resin composition for a black matrix in a solution state.

[0178] Moreover, the preparation method of the photosensitive resin composition for black matrices is not specifically limited. The black pigment (E) can be directly added to the alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), a first crosslinking agent (F) and It is formed b...

Synthetic example A-1

[0201] Synthesis Example A-1-1 to Synthesis Example A-1-3 of the resin (A-1) having an unsaturated group are described below:

Synthetic example A-1-1

[0203] First, 100 parts by weight of fluorene epoxy compound (model ESF-300, manufactured by Nippon Steel Chemical; epoxy equivalent 231), 30 parts by weight of acrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, 0.1 parts by weight of Parts of 2,6-di-tert-butyl-p-cresol and 130 parts by weight of propylene glycol methyl ether acetate were added to a 500 ml four-neck flask in a continuous manner. The feed rate is controlled at 25 parts by weight / min, and the temperature during the reaction is maintained at 100°C to 110°C. After 15 hours of reaction, a light yellow transparent mixed liquid with a solid content concentration of 50wt% can be obtained.

[0204] Then, 100 parts by weight of the above-mentioned light yellow transparent mixed solution was dissolved in 25 parts by weight of ethylene glycol ether acetate, and simultaneously added 6 parts by weight of tetrahydrophthalic anhydride and 13 parts by weight of diphenyl Methanone tetracarboxylic dianhydride....

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Abstract

A photosensitive resin composition for a black matrix including an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), a black pigment (E), a cross-linking agent (F), and an inorganic particle is provided. The alkali-soluble resin (A) includes a resin (A-1) having an unsaturated group, wherein the resin (A-1) having an unsaturated group is obtained by polymerizing a mixture including an epoxy compound having at least two epoxy groups and a compound having at least one carboxylic acid group and at least one ethylenically unsaturated group. The cross-linking agent (F) includes a cross-linking agent (F-1) obtained by reacting a novolac resin represented by formula (f-1) and an epihalohydrin under an existence of an alkali metal hydroxides. The inorganic particle employs oxides of a Group 4 element, oxides of silicone, or a combination thereof to serve as the major component.

Description

technical field [0001] The present invention relates to a photosensitive resin composition, and in particular to a photosensitive resin composition for a black matrix. Background technique [0002] In recent years, with the vigorous development of various liquid crystal display technologies, in order to improve the contrast and display quality of current liquid crystal displays, the stripes and dot gaps of color filters in liquid crystal displays are usually Place a black matrix in it. The above-mentioned black matrix can prevent problems such as decrease of contrast ratio and decrease of color purity caused by light leakage between pixels. [0003] Generally speaking, the materials used in the black matrix are mainly evaporated films containing chromium or chromium oxide. However, when the above vapor-deposited film is used as the material of the black matrix, there are disadvantages such as complicated manufacturing process and expensive materials. In order to solve thi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/027G03F7/004G02B5/20G02F1/1335
CPCG02B5/23G02F1/133514G02B1/04G03F7/027G02B5/003G03F7/0007G03F7/0047G03F7/038G03F7/0388G03F7/105C08L33/08C08L69/00
Inventor 廖豪伟谢岦庭
Owner CHI MEI CORP