Monitoring method and monitoring device for substrate processing
A monitoring device and substrate technology, applied in general control systems, program control, computer control, etc., can solve problems such as process accidents, time-consuming and labor-intensive, leakage friction or repeated friction, etc.
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[0052] As a specific implementation manner of the present invention, the step S20 includes:
[0053] S21. Setting a status flag corresponding to the information of each process in the status information;
[0054] S22. Convert the information of each process in the state information of the detected substrate into a corresponding state mark;
[0055] S23. Comparing the state mark of the detected substrate with the state mark corresponding to the predetermined process, when the state mark of the detected substrate is consistent with the state mark corresponding to the predetermined process, the substrate is in the state of having completed the predetermined process ; When the status flag of the monitored substrate is inconsistent with the status flag corresponding to the predetermined process, the substrate is in the state of not completing the predetermined process.
[0056] After the information of each process in the state information is converted into a corresponding state mar...
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