A kind of manufacture method of WS2 solid lubricating film

A technology of solid lubrication and manufacturing method, which is applied in the direction of ion implantation plating, metal material coating process, coating, etc., can solve the problems that cannot fully meet the requirements of long-life solid lubrication equipment and instruments, the influence of film wear resistance, and the impact of film surface Large roughness and other problems, to achieve the effect of short preparation time, long wear life and excellent wear resistance

Active Publication Date: 2018-05-01
BEIJING RES INST OF AUTOMATION FOR MACHINERY IND
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In the existing research results, magnetron sputtering technology is generally used to prepare tungsten disulfide solid lubricating film, but this technology has the problems of low production efficiency and inability to prepare thicker coatings
The film deposition speed is faster by ion plating, which can effectively improve production efficiency by replacing magnetron sputtering technology to prepare tungsten disulfide solid lubricating film, but ion plating will deposit a large number of large particles (5-10μm) on the surface of the workpiece, resulting in a film layer The surface roughness is relatively large, and the particles wrapped inside are easy to cause the film to peel off and fail, which affects the wear resistance of the film and cannot fully meet the needs of long-life solid lubrication equipment and instruments

Method used

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  • A kind of manufacture method of WS2 solid lubricating film
  • A kind of manufacture method of WS2 solid lubricating film
  • A kind of manufacture method of WS2 solid lubricating film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0052] 1) Put the sample to be processed into the magnetic filtration equipment, and use WS 2 / Ag composite target;

[0053] 2) Turn on the mechanical pump and molecular pump, turn on the circulating water system, and evacuate to 6.0×10 -4 Pa, start process;

[0054] 3) Introduce Ar gas to make the working pressure 5Pa ~ 10Pa, turn on the negative bias to -400V ~ -1000V, perform glow discharge, and clean the surface of the workpiece;

[0055] 4) The specific control parameters are: the arc voltage is 20V~36V, the negative bias voltage is -100V~-800V, and the arc current is 90A~100A. The duty ratio is 50-90%, and the deposition time is 1 h. The diameter of the magnetic filter tube is 200mm, the arc of the elbow is 0°, and the magnetic field deflection current is 1.6A~2.2A.

Embodiment 2

[0057] 1) Put the sample to be processed into the magnetic filtration equipment, and use WS 2 / Ag composite target;

[0058] 2) Turn on the mechanical pump and molecular pump, turn on the circulating water system, and evacuate to 6.0×10 -4 Pa, start process;

[0059] 3) Introduce Ar gas to make the working pressure 5Pa ~ 10Pa, turn on the negative bias to -400V ~ -1000V, perform glow discharge, and clean the surface of the workpiece;

[0060] 4) The specific control parameters are: the arc voltage is 20V~36V, the negative bias voltage is -100V~-800V, and the arc current is 90A~100A. The duty ratio is 50-90%, and the deposition time is 1 h. The diameter of the magnetic filter tube is 200mm, the arc of the elbow is 90°, and the magnetic field deflection current is 1.6A~2.2A.

[0061] The invention controls the growth of the film by adjusting parameters such as arc voltage, arc current, negative pressure, and duty cycle to optimize the structure of the film and improve the fr...

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Abstract

A method for manufacturing a WS2 solid lubricating film, using magnetic filter cathode vacuum arc deposition to form a WS2 solid lubricating film on the surface of a metal material substrate, comprising: pretreatment of the metal material substrate; generating a WS2 solid lubricating film, and depositing the metal material substrate Put it into a vacuum chamber and evacuate it; feed Ar gas, turn on the negative bias of the magnetic filter cathodic vacuum arc deposition device to -400V ~ -1000V, perform glow discharge, and clean the surface of the metal material substrate; compound with WS2 / Ag The target is a target material, and the WS2 / Ag film layer is deposited on the surface of the metal material substrate using the magnetic filter cathode vacuum arc deposition device, wherein the arc voltage of the magnetic filter cathode vacuum arc deposition device is 20V-36V, negative The bias voltage is -100V ~ -800V, the arc current is 90A ~ 100A, the duty cycle is 50 ~ 90%, the deposition time is 1h; and the metal material substrate is sealed.

Description

technical field [0001] The invention relates to the manufacture of a solid lubricating film, in particular to a method for preparing a super-long-life tungsten disulfide solid lubricating film on a metal surface by using a magnetic filter cathodic vacuum arc deposition technique. Background technique [0002] Currently tungsten disulfide (WS 2 ) is the main research direction in the field of new solid lubrication at home and abroad. It has a lower coefficient of friction, higher extreme pressure resistance, and better oxidation resistance than MoS 2 , so it is suitable for harsh conditions such as high temperature, high vacuum, high load, high speed, high radiation, strong corrosion, and ultra-low temperature. The United States took the lead in applying it to military fields such as Mars exploration robots, airplanes, and space shuttles. [0003] In the existing research results, magnetron sputtering technology is generally used to prepare tungsten disulfide solid lubrica...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/06C23C14/28
Inventor 金杰黄晓林王月张昕
Owner BEIJING RES INST OF AUTOMATION FOR MACHINERY IND
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