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Heating device and vapor deposition equipment for vapor deposition

A heating device and evaporation technology, which is applied in vacuum evaporation plating, sputtering plating, ion implantation plating, etc., can solve problems such as uneven heating, unstable adjustment of evaporation deposition rate, and easy spraying of evaporation materials

Active Publication Date: 2018-12-21
BOE TECH GRP CO LTD +1
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The invention provides a heating device and evaporation equipment for evaporation, which solves the problems that the existing evaporation equipment is unevenly heated, the evaporation material is easy to spray, the performance is easy to deteriorate, and the adjustment of the evaporation deposition rate is not suitable for stability.

Method used

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  • Heating device and vapor deposition equipment for vapor deposition
  • Heating device and vapor deposition equipment for vapor deposition
  • Heating device and vapor deposition equipment for vapor deposition

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Embodiment Construction

[0027] The invention provides a heating device and evaporation equipment for evaporation, which solves the problems that the existing evaporation equipment is unevenly heated, the evaporation material is easy to spray, the performance is easy to deteriorate, and the adjustment of the evaporation deposition rate is not suitable for stability.

[0028] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the drawings in the embodiments of the present invention.

[0029] An embodiment of the present invention provides a heating device for evaporation, such as figure 2 As shown, the device includes: a crucible 10 for containing the evaporation raw materials; a movable heating unit 13 arranged outside the crucible 10 and higher than the top of the evaporation raw materials during evaporation; a weighing sensor device 14 arranged on The bottom of the crucible 10 is used to weigh and output the weigh...

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PUM

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Abstract

The invention discloses a heating device and evaporation equipment for evaporation, which relate to the field of display device production and can solve the problem of uneven heating of existing evaporation equipment, easy spraying of evaporation materials, and easy occurrence of performance degradation. Unsuitable stability problem when adjusting. The heating device for vapor deposition provided by the present invention includes: a crucible for containing vapor deposition raw materials; a movable heating unit arranged outside the crucible and higher than the vapor deposition raw materials during vapor deposition; a weighing sensor device , arranged below the crucible, used to weigh the crucible and the weight of the evaporation material in the crucible and output it; the controller is used to receive the output of the weighing sensor device, according to the crucible and the crucible Calculate the liquid level height of the evaporation material in the crucible according to the weight of the evaporation material, and control the height from the movable heating unit to the evaporation material according to the liquid level.

Description

technical field [0001] The invention relates to the field of display device manufacture, in particular to a heating device and evaporation equipment for evaporation. Background technique [0002] Organic materials are an important guarantee for the stability of OLED (Organic Light-Emitting Diode, organic laser display) components. At present, large-generation lines are formed by evaporation, which requires the evaporation heating system to ensure a stable plating rate. , to maintain the material properties so that it does not deteriorate due to heat. [0003] Existing OLED line source evaporation such as figure 1 As shown, the evaporation raw material is placed in the crucible 10, and the heating source is the heating wire 11 wound and fixed outside the crucible 10. During operation, the evaporation raw material is heated and vaporized and escapes from the nozzle 12 to form a film on the substrate. On the one hand, this overall heating design improves the overall heating r...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/26C23C14/54C23C14/12
CPCC23C14/12C23C14/26C23C14/543C23C14/243C23C14/541
Inventor 黄俊淞刘晓云叶岚凯
Owner BOE TECH GRP CO LTD
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