Multi-angle Spectral Sensitivity Analysis Method of Film System and Its Application
A sensitivity analysis, multi-angle technology, used in optics, optical components, instruments, etc., can solve problems such as aggravating product optical uniformity and optical performance changes, shortening product development cycles, optimizing product performance, and avoiding product debugging. Effect
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Embodiment 1
[0042] Take magnetron sputtering plating large area solar selective absorption film as an example. The solar selective absorption film is mainly used for photothermal conversion. Its main goal is to absorb solar energy to the greatest extent and convert it into heat energy, so its main performance is solar energy. The higher the solar absorption rate, the better the product performance. Because the absorption rate is not easy to measure directly, and the solar selective absorption film is plated on the aluminum plate, its transmittance is 0. According to the principle of energy conservation, the product's absorption rate = 1-reflectance, so if the product's solar absorption rate The maximum is equivalent to the minimum solar reflectance. Table 1 shows the target configuration of the production line and the film sequence determined by it. The substrate is an aluminum plate with a thickness of 1mm; when magnetron sputtering is used to coat the solar selective absorption film, Al ...
Embodiment 2
[0063] The following uses an antireflection and antireflection film as an example. The anti-reflection and anti-reflection film is to increase the transmittance of the substrate and reduce the reflectivity by plating multilayer films with different optical constants on the surface of the substrate. The substrate can be transparent materials such as glass and resin. The performance of AR coating is mainly for visible light, so the wavelength range of the calculation and analysis is the visible light band of 380 to 780 nm. According to the characteristics of performance requirements, the visible light transmittance of the product film should be maximized. The present invention uses 3mm borosilicate glass as the substrate. Table 7 shows the target configuration of the production line and the film sequence determined by it. The production conditions prepare a total of 4 layers of antireflection and antireflection film, using Nb, Si NbOx and SiOx thin films were prepared by reactive...
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