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A substrate carrier and a substrate processing device

A technology of substrate carrier and support substrate, applied in electrostatic, electrical components, semiconductor/solid-state device manufacturing, etc., can solve the problems of long processing time, glass breakage, short validity period, etc., to ensure production and processing efficiency, quality assurance, reduce or the effect of eliminating static electricity

Inactive Publication Date: 2018-06-08
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
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AI Technical Summary

Problems solved by technology

It often happens that the glass substrate and the machine in the equipment cannot be properly aligned due to electrostatic adsorption, and even the glass is damaged. This problem takes a long time to deal with
At present, anti-static liquid coating is used to prevent static electricity generation, but this method has a short validity period, and the one-time coating equipment is out of service for too long, and it is not yet possible to prove whether the processing process will denature the anti-static liquid

Method used

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  • A substrate carrier and a substrate processing device
  • A substrate carrier and a substrate processing device

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Embodiment Construction

[0026] In order to make the technical problems, technical solutions and advantages to be solved by the present invention clearer, the following will describe in detail with reference to the drawings and specific embodiments.

[0027] The present invention firstly provides a substrate carrier for carrying substrates, such as figure 1 shown, including:

[0028] The support bar 101 used to support the substrate, the support surface of the support bar 101 is provided with a plurality of first air outlet holes 102, and the inside of the support bar is provided with an air outlet pipe 103 communicating with the plurality of first air outlet holes 102 , for delivering gas to the plurality of first gas outlet holes 102 to support the substrate;

[0029] An ion wind delivery structure for delivering ion wind to the substrate;

[0030] An ion wind supply structure for supplying ion wind to the ion wind transport structure.

[0031] During the processing of the substrate, due to the s...

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PUM

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Abstract

The invention provides a substrate stage and a substrate processing device. The substrate stage is used for bearing a substrate and comprises a support strip for supporting the substrate, an ion wind conveyer structure and an ion wind supply structure, wherein a plurality of first air outlets are arranged in a support surface of the support strip; an air outlet pipe communicating with the plurality of first air outlets is arranged in the support strip and is used for conveying a gas to the plurality of first air outlets to support the substrate; the ion wind conveyer structure is used for conveying ion wind to the substrate; and the ion wind supply structure is used for supplying the ion wind conveyer structure with the ion wind. The substrate processing device comprises the substrate stage provided by any embodiment of the invention. According to the substrate stage and the substrate processing device provided by the invention, static electricity of the substrate in the processing process can be reduced.

Description

technical field [0001] The invention relates to the field of production and manufacturing, in particular to a substrate carrier and a substrate processing device. Background technique [0002] During the processing of the display substrate, due to the short time interval between adjacent glass substrates entering the equipment, the effective distance of the ion bar above the machine in the equipment to remove static electricity is relatively short. It often happens that the glass substrate and machine table in the equipment cannot be aligned normally due to electrostatic adsorption, and even the glass is broken. This problem takes a long time to deal with. At present, antistatic liquid coating is used to prevent static electricity generation, but this method has a short validity period, and the one-time coating equipment is out of service for too long, and it is not yet possible to prove whether the processing process will denature the antistatic liquid. Contents of the in...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67
CPCH05F3/06
Inventor 张继山
Owner BOE TECH GRP CO LTD
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