Check patentability & draft patents in minutes with Patsnap Eureka AI!

Substrate, alignment mark for substrate positioning and alignment method

A technology of alignment marks and substrates, which is applied in the direction of photolithography, optics, instruments, etc. on the pattern surface, and can solve problems such as small detection range and rough alignment failure

Active Publication Date: 2017-06-20
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
View PDF7 Cites 11 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] In order to solve the technical problem that the detection range of the alignment mark in the prior art is small, and it is easy to cause rough alignment failure, the present invention provides a positioning mark and a positioning method for substrate positioning, and also provides a positioning mark including a positioning mark. Substrate, used to increase the detection range of positioning marks and improve the success rate of rough alignment

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Substrate, alignment mark for substrate positioning and alignment method
  • Substrate, alignment mark for substrate positioning and alignment method
  • Substrate, alignment mark for substrate positioning and alignment method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0035] The present invention will be further described below in conjunction with accompanying drawing.

[0036] The alignment mark in the present invention is mainly used for the coarse alignment step in substrate positioning.

[0037] like Figure 4 As shown, it is an alignment mark for substrate positioning in an embodiment of the present invention, including a first alignment unit 41, wherein the point to be positioned 40 is located on the substrate. When designing the alignment mark, the first alignment unit Extending from the point to be positioned to both sides, we get the following Figure 4 In the strip-shaped structure shown, the direction of the long side of the strip-shaped structure is the first direction. In practical applications, the first direction can be the horizontal direction or the vertical direction. Of course, it can also be For other arbitrary directions, it is generally required that the alignment system in the first direction has higher precision an...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an alignment mark based on substrate positioning. The alignment mark comprises a first alignment unit, wherein the first alignment unit is of a strip-shaped structure which extends from a to-be-positioned point to two sides; the long side direction of the strip-shaped structure is a first direction, and a second direction is vertical to the first direction; a second alignment unit is arranged on the strip-shaped structure in the second direction, and comprises a plurality of second alignment structures, and the second alignment structures are arranged in the first direction at intervals. The invention also discloses a substrate comprising the alignment mark, and an alignment method. The alignment mark has the advantages that the detection range of the positioning mark is increased, and the success rate of coarse alignment in the substrate positioning is improved.

Description

technical field [0001] The invention relates to the field of display panel production, in particular to an alignment mark for a substrate and an alignment method. Background technique [0002] Since the display panel has a relatively fine structure, the production process of the display panel is also required to be relatively fine. Therefore, in the production process of display panels, many sites have high requirements for position accuracy, such as exposure and detection. [0003] In the prior art, high-precision positioning is generally divided into two steps, which generally include coarse alignment and fine alignment. Generally speaking, when the coarse alignment is normal, the subsequent fine alignment using a high-magnification lens can obtain more accurate alignment results. In the process of rough alignment and fine alignment, the method of setting alignment marks (Mark) on the surface of the object to be aligned is generally used to improve the alignment accuracy...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G09F9/00G03F9/00
Inventor 龚成波
Owner WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com