Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Antibacterial and anti-mildew mesh fabric with characteristics of easy cleaning and deodorization

An easy-to-clean and anti-bacterial technology, applied in the field of textile fabrics and fabrics, can solve the problems of easy staining, affecting wearing comfort, and easy embedding of dirt inside the fabric, so as to achieve the effect of not being prone to bacteria and mildew

Inactive Publication Date: 2018-03-13
JIANGYIN HUAYIN CERAMIC ELECTROMECHANICAL TECH
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Mesh fabrics are generally used for the mesh surface of sports shoes and casual shoes, which play a breathable role. During the wearing process of footwear, the heat generated by the feet will be released from the upper and upper of the shoes to cool the feet and avoid Bacteria grows on the feet, but the mesh fabric is easy to be stained during the wearing of shoes, and due to the grid’s holding effect, dirt is easy to be embedded in the fabric, which is not easy to clean and affects the wearing comfort

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Antibacterial and anti-mildew mesh fabric with characteristics of easy cleaning and deodorization

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0014] see figure 1 , the invention relates to an easy-to-clean and deodorizing grid fabric that is not easy to produce bacteria and mildew, including an easy-to-clean functional layer, both sides of the easy-to-clean functional layer are provided with a mesh layer, and the inner side of the mesh layer is provided with an inner lining layer; the radially uniform arrangement of activated carbon fiber bundles inside the inner layer; the easy-to-clean functional layer and the mesh layer are fixed with water-based polyurethane glue inside and outside, and the inner layer and mesh layer are fixed by sewing; the The easy-to-clean functional layer is made of blended holy hemp fiber and ramie fiber; the mesh layer is made of three-dimensional mesh superfine fiber base cloth; the inner layer includes warp and weft, and the warp is made of long-staple cotton fiber The fineness is 100-320dtex; the weft is woven with apocynum fiber.

[0015] The back side of the inner layer is provided w...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Finenessaaaaaaaaaa
Login to View More

Abstract

The invention relates to an antibacterial and anti-mildew mesh fabric with characteristics of easy cleaning and deodorization. The antibacterial and anti-mildew mesh fabric comprises an easy-cleaningfunction layer (1), wherein both sides of the easy-cleaning function layer are respectively provided with a mesh cloth layer (2), the inner side of the mesh cloth layer (2) is provided with an inner lining layer, active carbon fiber bundles (4) are radially and uniformly arranged in the interior of the lining layer (3), the back surface of the lining layer is provided with a lining fabric layer, the lining fabric layer comprises a base cloth layer formed by weaving a lace thread body, the base cloth layer comprises an inner cloth layer and an outer cloth layer, a nanometer antibacterial and anti-mildew coating material layer is arranged between the inner cloth layer and the outer cloth layer, and a Megastar anti-microbial crystal protection shield layer is arranged on the outer surface ofthe outer cloth layer. According to the present invention, the antibacterial and anti-mildew mesh has effects of deodorization and drying, and further is antibacterial and anti-mildew.

Description

technical field [0001] The invention relates to a fabric, in particular to an easy-to-clean and deodorizing grid fabric, which belongs to the field of textile fabrics. Background technique [0002] Mesh fabrics are generally used for the mesh part of sports shoes and casual shoes, which play a breathable role. During the wearing process of footwear, the heat generated by the feet will be emitted from the uppers and uppers to cool the feet and avoid Bacteria grows on the feet, but the mesh fabric is easy to stain during the wearing of shoes, and due to the holding effect of the mesh, dirt is easily embedded in the fabric, which is not easy to clean and affects the wearing comfort. Contents of the invention [0003] The object of the present invention is to overcome the above disadvantages and provide an easy-to-clean mesh fabric. [0004] The purpose of the present invention is achieved in this way: an easy-to-clean and deodorizing grid fabric that is not easy to produce b...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): B32B5/08B32B3/08B32B5/06B32B7/12B32B9/02
CPCB32B5/024B32B5/028B32B5/06B32B5/08B32B5/26B32B7/12B32B33/00B32B2255/02B32B2262/062B32B2262/065B32B2262/14B32B2437/02
Inventor 华国金
Owner JIANGYIN HUAYIN CERAMIC ELECTROMECHANICAL TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com