Pattern drawing apparatus and pattern drawing method
A technology for drawing devices and patterns, which is applied to photolithographic process exposure devices, photolithographic processes for pattern surfaces, and electrical recording processes using charge patterns, etc.
Active Publication Date: 2018-12-04
NIKON CORP
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Problems solved by technology
However, when the pattern of the image to be drawn is a pattern used for electronic components, even if the magnification error is corrected only by changing the frequency of the clock signal as in Japanese Patent Laid-Open No. 2009-20489, it is impossible to finely Compatible with high-precision magnification correction
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[0045] Preferred embodiments of the pattern drawing device and the pattern drawing method according to the aspects of the present invention will be described in detail below with reference to the accompanying drawings. In addition, the aspect of this invention is not limited to these embodiment, The thing which added various changes or improvement is included. That is, the constituent elements described below include those that can be easily assumed by the practitioner and those that are substantially the same, and the constituent elements described below can be appropriately combined. In addition, various omissions, substitutions, or changes of components can be made without departing from the scope of the present invention.
[0046] [First Embodiment]
[0047] figure 1 It is a figure which shows the schematic structure of the element manufacturing system 10 including the exposure apparatus EX which performs exposure processing to the board|substrate (irradiated object) P o...
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Abstract
This pattern rendering device (EX), in which the intensity of a beam (LB) from a light source (LS) is modulated in accordance with pattern information and a pattern is formed on a substrate (P) by projecting the beam (LB) on the substrate (P) and scanning said beam (LB) in a main scanning direction, is provided with: a scanning device (14) in which, in order to scan the beam (LB) in the main scanning direction, a plurality of scanning units (Un) that include a deflection member (PM) that deflects the beam (LB) from the light source (LS) are arranged such that the scanning paths of the beam (LB) projected on the substrate (P) are offset from each other; and an electro-optical deflection device (BDU) that switches the beam (LB) from the light source (LS) to a deflected state or an undeflected state in order to supply the beam (LB) from the light source (LS) to the scanning units (Un) in a time division manner, and can adjust the deflection angle of the beam (LB) in order to shift the scanning path of the beam (LB) in a sub-scanning direction that intersects with the main scanning direction.
Description
[0001] This application is a divisional application of a patent application with an application date of September 27, 2016, an application number of 201680056753.1, and an invention title of "pattern drawing device and pattern drawing method". technical field [0002] The present invention relates to a pattern drawing device and a pattern drawing method for scanning focused light irradiated onto an irradiated body to draw a pattern. Background technique [0003] As a drawing device using a rotating polygon mirror, for example, an electrophotographic image forming device is known, which uses a polygon mirror to repeat beams from a laser diode (LD) as disclosed in Japanese Patent Application Laid-Open No. 2009-20489. deflection, and make the deflected beam scan on the photoreceptor through the fθ lens. In the image forming apparatus disclosed in Japanese Unexamined Patent Application Publication No. 2009-20489, the write operation including the laser diode (LD), rotating polyg...
Claims
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IPC IPC(8): G03G15/04G02B13/00G02B26/12G02F1/11
CPCG03F7/2057G03F7/70358G03F7/70291G02F1/33G02B26/12G03F7/20G03F7/24G03F7/2006G03F7/70566
Inventor 加藤正纪中山修一
Owner NIKON CORP