A 2.5 D portrait shallow relief modeling method and system

A modeling method and technology of bas-relief, applied in the field of portrait bas-relief modeling, to achieve the effect of flexible parameter setting and high degree of automation

Active Publication Date: 2019-01-11
QILU UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The technical task of the present invention is to address the above deficiencies and provide a 2.5D portrait bas-relief modeling method and system to solve the problem of how to save time and effort to build a 2.5D portrait bas-relief model that can be adjusted and clearly display geometric details

Method used

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  • A 2.5 D portrait shallow relief modeling method and system
  • A 2.5 D portrait shallow relief modeling method and system
  • A 2.5 D portrait shallow relief modeling method and system

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Experimental program
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Embodiment 1

[0067] as attached figure 1 Shown, a kind of 2.5D portrait bas-relief modeling method of the present invention comprises the steps:

[0068] S100. Model preprocessing: After preset mapping angles, convert the input original 3D portrait model into a 2.5D height field model, and perform normal detail enhancement on the 2.5D height field model;

[0069] S200. Height field generation and optimization: perform linear compression on the 2.5D height field model, generate an initial portrait bas-relief, and restore and optimize the height field details of the initial portrait bas-relief;

[0070] S300. Local height field editing: Divide the initial portrait bas-relief into multiple different regions, calculate a thickness scaling factor for each region, and perform regional multi-scale scaling on the initial portrait bas-relief based on the aforementioned thickness scaling factors.

[0071] In step S100, since the shallow relief is generally classified as a height field model without...

Embodiment 2

[0110] A 2.5D portrait bas-relief modeling system, including a model preprocessing module, a height field generation and optimization module, a height field local editing module, the model preprocessing module is connected with the height field generation and optimization module, and the height field generation and optimization module is connected with the Heightfield local editing module connection.

[0111] The model preprocessing module is a module with the following functions: it can support users to preset the mapping angle, it can automatically convert the original 3D portrait model into a 2.5D height field model, and it can enhance the normal details of the 2.5D height field model; height field generation And the optimization module is a module with the following functions: it can import a 2.5D height field model, can perform linear compression on the 2.5D height field model to generate the initial portrait bas-relief, and can recover and optimize the height field detail...

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Abstract

The invention discloses a 2.5 D portrait shallow relief modeling method and system, belonging to the field of portrait shallow relief modeling. The technical problem to be solved is how to construct a2.5 D portrait shallow relief model with adjustable geometric details and clear display, which can save time and labor. The method comprises the following steps: model preprocessing: after presettingthe mapping angle, the original three-dimensional portrait model is transformed into 2.5 D height field model, and the 2.5 D height field model is enhanced in normal detail; height field generation and optimization: the 2.5 D height field model is compressed linearly to generate the initial portrait relief, and the height field details of the initial portrait relief are restored and optimized; height field local editing: the initial portrait shallow relief is scaled regionally and multiscale based on the thickness scaling factor. Its structure includes a model preprocessing module, a height field generation and optimization module, and a height field local editing module. The invention can construct a portrait bas-relief which can adjust and clearly display geometric details.

Description

technical field [0001] The invention relates to the field of portrait bas-relief modeling, in particular to a 2.5D portrait bas-relief modeling method and system. Background technique [0002] Portrait relief is a unique art form between 2D images and 3D sculptures. Generally, a single material is used to create a sense of space through convex and concave fluctuations and light and shadow changes. application. Traditional portrait relief modeling uses commercial software such as Zbrush, ArtForm, and JDPaint, which requires a lot of manual interaction, which is time-consuming and labor-intensive. With the diversification of 3D material acquisition methods, the modeling method of generating reliefs by compressing 3D models has been paid more and more attention. Its advantages are high degree of automation, flexible selection of mapping angles, and easy control of geometric details. [0003] Existing bas-relief modeling research is generally oriented to general-purpose relief...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06T17/00
CPCG06T17/00
Inventor 张玉伟王传顺
Owner QILU UNIV OF TECH
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