Surface treatment method for superfine metal nickel powder

Abstract

The invention discloses a surface treatment method for superfine metal nickel powder. The method comprises the following steps that a, submicron metal nickel powder is added into a reactor to be heated to form a liquid state, and then heating and evaporating are carried out to form nickel steam; b, the nickel steam formed in the step a rises into a condensation pipe, and meanwhile, a gas distributor in the condensation pipe is opened to be filled with nitrogen gas for cooling; c, the nickel powder particles formed in the step b enters a pulse cooling chamber from the condensation pipe, oxygenis fully contacted with the high-temperature nickel powder particles, the oxygen and the nickel powder particles are subjected to oxidation reaction to generate nickel oxide; and d, the nickel powderparticles formed in the step c enter a cooling chamber to be cooled to 80-120 DEG C, meanwhile, air exhausting is carried out on inletting air of the cooling chamber, and the nickel powder falls intoa collecting device. According to the method, an oxygen flow is controlled, meanwhile, nickel hydroxide is heated to separate the water, and the nickel hydroxide content of the nickel powder is reduced, powder is uniformly heated in the oxidation process, the oxygen content distribution is uniform, the content of nickel oxide is high.

Description

technical field

[0001] The invention relates to the technical field of submicron metal powder preparation, in particular to a surface treatment method for superfine metal nickel powder. Background technique

[0002] At present, in the MLCC industry, nickel metal is generally used as the internal electrode. For different products such as high, medium and low-end products, the content of oxygen in nickel powder has different requirements. The content of nickel oxide in nickel powder directly affects the matching between the manufacturing process and ceramics. and capacitor quality.

[0003] In the submicron metal powder preparation industry, chemical vapor deposition (CVD) and physical vapor phase (PVD) methods are used to produce metal nickel powder, and the metal nickel powder produced by the two methods has problems such as nickel oxide content. In the physical vapor phase (PVD) production process, the system uses nitrogen as a carrier to prepare nickel powder in a low-oxy...

Examples

Embodiment 1

[0035] a. The spherical submicron metal nickel powder produced by PVD method, the nickel powder particle size is 0.05 μm, is added to the reactor 1 and heated to form a liquid state, and then heated and evaporated to form nickel vapor; at the same time, the reactor is filled with nitrogen; b. . Nickel vapor rises into the condenser pipe 2, and at the same time, the gas distributor in the condenser pipe 2 is opened to fill in nitrogen. The temperature of the nickel vapor coming out of the condenser pipe 2 is 300°C; c. Nickel powder particles enter the pulse from the condenser pipe 2. Cooling chamber 3, the flow channel cross-sectional area of ​​the pulse cooling chamber 3 is 3 times the cross-sectional area of ​​the outlet of the condensation pipe 2, and the gas distributor in the pulse cooling chamber 3 is filled with air to make the oxygen content volume in the pulse cooling chamber 3 The concentration is 0.3%; the temperature inside the pulse cooling chamber 3 is 300°C, the n...

Embodiment 2

[0037] The spherical submicron metal nickel powder produced by PVD method, the nickel powder particle size is 5 μm, is added to the reactor 1 and heated to form a liquid state, and then heated and evaporated to form nickel vapor; at the same time, the reactor is filled with nitrogen; b, nickel vapor Rise into the condensation pipe 2, and at the same time open the gas distributor in the condensation pipe 2 to fill in the air, the temperature of the nickel vapor from the outlet of the condensation pipe 2 is 500 °C; c, the nickel powder particles enter the pulse cooling chamber 3 from the condensation pipe 2 , the flow channel cross-sectional area of ​​the pulse cooling chamber 3 is 5 times of the cross-sectional area of ​​the condensation pipe 2 outlets, and the gas distributor in the pulse cooling chamber 3 is filled with air, so that the oxygen content volume concentration in the pulse cooling chamber 3 is 0.3 %; The temperature in the pulse cooling chamber 3 is 500°C, the nick...

Embodiment 3

[0039] The spherical submicron metal nickel powder produced by the PVD method, the nickel powder particle size is 3 μm, is added to the reactor 1 and heated to form a liquid state, and then heated and evaporated to form nickel vapor; at the same time, the reactor is filled with nitrogen; b. Nickel vapor Rise into the condensation pipe 2, and at the same time open the gas distributor in the condensation pipe 2 to fill in the air, the temperature of the nickel vapor from the outlet of the condensation pipe 2 is 420 °C; c, the nickel powder particles enter the pulse cooling chamber 3 from the condensation pipe 2 , the flow path cross-sectional area of ​​the pulse cooling chamber 3 is 4 times of the cross-sectional area of ​​the condenser tube 2 outlets, and the gas distributor in the pulse cooling chamber 3 is filled with air so that the oxygen content volume concentration in the pulse cooling chamber 3 is 0.3 %; The temperature in the pulse cooling chamber 3 is 450° C., the nicke...

technical field

[0001] The invention relates to the technical field of submicron metal powder preparation, in particular to a surface treatment method for superfine metal nickel powder. Background technique

[0002] At present, in the MLCC industry, nickel metal is generally used as the internal electrode. For different products such as high, medium and low-end products, the content of oxygen in nickel powder has different requirements. The content of nickel oxide in nickel powder directly affects the matching between the manufacturing process and ceramics. and capacitor quality.

[0003] In the submicron metal powder preparation industry, chemical vapor deposition (CVD) and physical vapor phase (PVD) methods are used to produce metal nickel powder, and the metal nickel powder produced by the two methods has problems such as nickel oxide content. In the physical vapor phase (PVD) production process, the system uses nitrogen as a carrier to prepare nickel powder in a low-oxy...

Examples

Embodiment 1

[0035] a. The spherical submicron metal nickel powder produced by PVD method, the nickel powder particle size is 0.05 μm, is added to the reactor 1 and heated to form a liquid state, and then heated and evaporated to form nickel vapor; at the same time, the reactor is filled with nitrogen; b. . Nickel vapor rises into the condenser pipe 2, and at the same time, the gas distributor in the condenser pipe 2 is opened to fill in nitrogen. The temperature of the nickel vapor coming out of the condenser pipe 2 is 300°C; c. Nickel powder particles enter the pulse from the condenser pipe 2. Cooling chamber 3, the flow channel cross-sectional area of ​​the pulse cooling chamber 3 is 3 times the cross-sectional area of ​​the outlet of the condensation pipe 2, and the gas distributor in the pulse cooling chamber 3 is filled with air to make the oxygen content volume in the pulse cooling chamber 3 The concentration is 0.3%; the temperature inside the pulse cooling chamber 3 is 300°C, the n...

Embodiment 2

[0037] The spherical submicron metal nickel powder produced by PVD method, the nickel powder particle size is 5 μm, is added to the reactor 1 and heated to form a liquid state, and then heated and evaporated to form nickel vapor; at the same time, the reactor is filled with nitrogen; b, nickel vapor Rise into the condensation pipe 2, and at the same time open the gas distributor in the condensation pipe 2 to fill in the air, the temperature of the nickel vapor from the outlet of the condensation pipe 2 is 500 °C; c, the nickel powder particles enter the pulse cooling chamber 3 from the condensation pipe 2 , the flow channel cross-sectional area of ​​the pulse cooling chamber 3 is 5 times of the cross-sectional area of ​​the condensation pipe 2 outlets, and the gas distributor in the pulse cooling chamber 3 is filled with air, so that the oxygen content volume concentration in the pulse cooling chamber 3 is 0.3 %; The temperature in the pulse cooling chamber 3 is 500°C, the nick...

Embodiment 3

[0039] The spherical submicron metal nickel powder produced by the PVD method, the nickel powder particle size is 3 μm, is added to the reactor 1 and heated to form a liquid state, and then heated and evaporated to form nickel vapor; at the same time, the reactor is filled with nitrogen; b. Nickel vapor Rise into the condensation pipe 2, and at the same time open the gas distributor in the condensation pipe 2 to fill in the air, the temperature of the nickel vapor from the outlet of the condensation pipe 2 is 420 °C; c, the nickel powder particles enter the pulse cooling chamber 3 from the condensation pipe 2 , the flow path cross-sectional area of ​​the pulse cooling chamber 3 is 4 times of the cross-sectional area of ​​the condenser tube 2 outlets, and the gas distributor in the pulse cooling chamber 3 is filled with air so that the oxygen content volume concentration in the pulse cooling chamber 3 is 0.3 %; The temperature in the pulse cooling chamber 3 is 450° C., the nicke...

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