Megasonic cleaning method, device and megasonic cleaning equipment
A cleaning equipment and megasonic wave technology, which is applied in the field of megasonic cleaning, can solve the problems of inability to clean wafers and poor cleaning effect of wafers, etc., and achieve the effect of improving the cleaning effect
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Embodiment 1
[0053] This embodiment provides a megasonic cleaning method, which is applied to the controller of the megasonic cleaning equipment, such as figure 1 Shown is a flow diagram of a megasonic cleaning method comprising:
[0054] Step S102, acquiring setting parameters of the megasonic nozzle.
[0055] The embodiment of the present invention provides a human-computer interaction interface, so that the process engineer can perform parameter setting on the human-computer interaction interface according to the actual situation of the wafer, for example, setting the operating frequency, the starting point of operation, the end point of operation, the number of partitions of the wafer, Setting parameters such as the time ratio and operating unit of each partition, such as figure 2 Shown is the parameter setting diagram of the running track of the megasonic nozzle. After setting the parameters, the controller in the megasonic cleaning equipment obtains the setting parameters and contr...
Embodiment 2
[0069] Corresponding to the above method embodiments, this embodiment provides a megasonic cleaning device, which is applied to the controller of the megasonic cleaning equipment, such as Figure 4 As shown, the device includes:
[0070] The obtaining module 41 is used to obtain the setting parameters of the megasonic nozzle; the setting parameters include at least one of the following: operating frequency, operating start point, operating end point, number of wafer partitions, and time ratio of each partition;
[0071] The first determination module 42 is used to determine the operating area of the megasonic shower head on the wafer according to the set parameters;
[0072] The second determination module 43 is used to determine the partition of the wafer and the running time of the megasonic shower head in each partition according to the set parameters;
[0073] The fitting module 44 is used to fit the running trajectory of the megasonic sprinkler in each zone according t...
Embodiment 3
[0082] The embodiment of the present invention provides a megasonic cleaning equipment, such as Figure 5 As shown, the megasonic cleaning equipment includes: a memory 51, a controller 52, and a computer program that can run on the controller 52 is stored in the memory 51. When the controller executes the computer program, it realizes the above-mentioned photo archiving method provided by the power transmission line equipment. step.
[0083] like Figure 5 As shown, the device also includes: a bus 53 and a communication interface 54, the controller 52, the communication interface 54 and the memory 51 are connected through the bus 53; the controller 52 is used to execute executable modules stored in the memory 51, such as computer programs.
[0084] It can be understood that, the device also includes: a megasonic shower head, which is used to clean the wafer under the action of the controller 52 .
[0085] Wherein, the memory 51 may include a high-speed random access memory (...
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