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Measuring system, lithography system and method of measuring target

A technology of measurement system and detection system, which is applied in the field of measurement target and can solve problems such as changing measurement quality

Active Publication Date: 2021-10-15
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, different targets in different layers may exhibit different behaviors for different wavelengths of measurement radiation, which can lead to varying measurement quality

Method used

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  • Measuring system, lithography system and method of measuring target
  • Measuring system, lithography system and method of measuring target
  • Measuring system, lithography system and method of measuring target

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Embodiment Construction

[0024] This specification discloses one or more embodiments that include the features of this invention. The disclosed embodiments are merely illustrative of the invention. The scope of the invention is not limited to the disclosed embodiments. The invention is defined by the appended claims.

[0025] Embodiments are described and references in the specification to "one embodiment," "an embodiment," "exemplary embodiment," etc. indicate that the described embodiment may include a particular feature, structure, or characteristic, but each embodiment The particular feature, structure or characteristic may not necessarily be included. Moreover, these phrases are not necessarily referring to the same embodiment. Furthermore, when a particular feature, structure or characteristic is described in conjunction with an embodiment, it is to be understood that it is within the scope of those skilled in the art to implement such feature, structure or characteristic in combination with ...

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PUM

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Abstract

A measurement system is disclosed wherein a first optical system separates an input radiation beam into a plurality of components. A modulator receives the plurality of components and applies modulation to at least one of the plurality of components independently of at least one other of the plurality of components. A second optical system illuminates the target with the plurality of components and directs radiation scattered by the target to a detection system. The detection system is configured to distinguish each of the one or more components of the radiation directed to the detection system based on the modulation applied to each component or group of components by the modulator, or to distinguish Each of one or more components of said radiation directed to said detection system.

Description

[0001] Cross References to Related Applications [0002] This application claims priority from European application 16198200.4 filed on November 10, 2016, which is hereby incorporated by reference in its entirety. technical field [0003] The present invention relates to a measurement system, a photolithography system using the measurement system, and a method of measuring an object. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern to a substrate (usually a target portion of the substrate). For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern may be transferred onto a target portion (eg, including a portion of a die, one or more dies) on a substrate (eg, a silicon wafer). Typically, transfer of ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G03F9/00
CPCG03F7/70625G03F9/7046G03F9/7069G03F9/7088G03F7/70633G01N21/95607G03F7/7015
Inventor T·W·图克尔G·范德祖克A·辛格
Owner ASML NETHERLANDS BV