Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A low-impact development design and evaluation method and system

A low-impact development and facility technology, applied in computing, data processing applications, instruments, etc., can solve problems such as complex methods, low implementation efficiency, and high specialization requirements, and achieve simple and rapid processes, improve accuracy, and achieve flexibility sexual effect

Active Publication Date: 2022-06-03
SICHUAN PROVINCIAL ARCHITECTURAL DESIGN & RES INST
View PDF12 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The invention provides a low-impact development design and evaluation method and system, which solves the technical problems of high specialization requirements, complicated methods, and low implementation efficiency of existing methods

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A low-impact development design and evaluation method and system
  • A low-impact development design and evaluation method and system
  • A low-impact development design and evaluation method and system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0049] In the following description, numerous specific details are set forth in order to facilitate a full understanding of the present invention, however, the present invention may also be

[0069] Although the preferred embodiments of the present invention have been described, those skilled in the art will, once aware of the basic invention

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a low-impact development design and evaluation method and system. The overall scheme design and evaluation mode of the low-impact development design of the method is design-evaluation-redesign-re-evaluation. The method is based on the Excel tool to set the basic information of the project, The four units of sponge city control objectives, low-impact development and design, and result summary solve the technical problems of high specialization requirements, complex methods, and low implementation efficiency of existing methods.

Description

A low-impact development design and evaluation method and system technical field The present invention relates to sponge city construction field, specifically, relate to a kind of low-impact development design and evaluation method and system. Background technique In recent years, sponge city construction has gradually become a construction condition that must be met in urban construction projects. The scope of construction covers a wide range. For construction projects, the main binding indicators are the control rate of the total annual runoff and the reduction of annual runoff pollution. Divide ratio (in SS). At present, the low-impact development design is divided into design and evaluation in the planning stage, and the time and space of the two are different. At the moment, the means of quantitative analysis and evaluation of sponge city construction effect are mainly model method and volume method, with Whether the sponge city design of this verification pr...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G06Q10/06G06Q50/08G06Q50/26
CPCG06Q10/06393G06Q10/06313G06Q50/08G06Q50/26Y02A10/40
Inventor 付韵潮王家良曾丽竹邱壮杨艳梅龚克娜
Owner SICHUAN PROVINCIAL ARCHITECTURAL DESIGN & RES INST
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products