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X-ray analysis assistance device and x-ray analysis device

A technology of auxiliary equipment and analysis equipment, which is applied in the direction of material analysis, analysis material, and measurement device using wave/particle radiation, and can solve the problem that auxiliary equipment for X-ray analysis has not been developed yet.

Active Publication Date: 2019-10-25
RIGAKU CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, this type of auxiliary equipment for X-ray analysis has not yet been developed

Method used

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  • X-ray analysis assistance device and x-ray analysis device
  • X-ray analysis assistance device and x-ray analysis device
  • X-ray analysis assistance device and x-ray analysis device

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Experimental program
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Embodiment Construction

[0075] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

[0076] The X-ray analysis auxiliary apparatus according to the present embodiment is configured to be applied to a small-angle X-ray scatter measurement device and assume the setting of the measurement conditions of the small-angle X-ray scatter measurement device.

[0077] The small-angle X-ray scattering measurement device is an X-ray analysis device for measuring the X-ray scattered by the sample S when the X-ray is incident on the sample S in the low-angle region of 0°<2θ (diffraction angle)≤5° Scattered X-rays are used to evaluate the structure of a sample S, and it is generally used to evaluate structures on the order of several nanometers to hundreds of nanometers in size.

[0078] Figure 1AIt is a front view schematically showing the outline of the small-angle X-ray scattering measurement device. Figure 1B is a schematic diagram showing...

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Abstract

An X-ray analysis assistance device according to the present invention is provided with an input and operation device 24 for arbitrarily inputting and setting the value of one from among the distanceL between a sample S and a two-dimensional detector 2 and the maximum detection range Xmax for X-rays scattered or diffracted by the sample S, and a central processing unit 20 for automatically setting the other setting item on the basis of the value of the one setting item set by the input and operation device 24. Further, the maximum measurement frame Hmax for the X-rays is displayed on a display screen 22 of a display device 21 on the basis of the distance L and maximum detection range Xmax. Additionally, an X-ray detection area A indicating the range within which it is possible for the detection surface of the two-dimensional detector 2 to detect X-rays is displayed on the display screen 22 of the display device 21.

Description

technical field [0001] The present invention relates to an auxiliary device for X-ray analysis, which aims at an X-ray analysis device for detecting X-rays generated by a two-dimensional detector when X-rays from an X-ray source are incident on a sample. The sample scatters or diffracts X-rays, and this X-ray analysis auxiliary device is used to set the measurement conditions of the X-ray analysis device. Background technique [0002] For example, a small-angle and wide-angle X-ray measuring device disclosed in Japanese Patent Laid-Open No. 2009-2805 (Patent Document 1) is an X-ray analysis device for detecting X-rays scattered by a sample when X-rays are made incident on the sample , and the structure of the sample can be analyzed based on the X-ray information obtained by the X-ray analysis device. [0003] In order to analyze the structure of a sample by using this type of X-ray analysis apparatus, it is natural to know the operation process of the apparatus in advance, ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N23/201G01N23/207
CPCG01N23/20008G01N23/201G01N23/207G01N23/205
Inventor 谷口弥生森川惠一
Owner RIGAKU CORP