Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A dmd-based subtraction method for scattering interference of dispersive afs light source

A technology of scattering interference and light source, applied in the field of spectral analysis, can solve problems such as cumbersome process, achieve the effect of improving measurement intensity, simplifying measurement, and quickly deducting scattering

Active Publication Date: 2021-06-25
JILIN UNIV
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In the prior art, the deduction of light source scattering interference is mostly carried out by calculating the interference coefficient method. This method requires multiple measurements and the calculation of the interference coefficient is relatively cumbersome.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A dmd-based subtraction method for scattering interference of dispersive afs light source
  • A dmd-based subtraction method for scattering interference of dispersive afs light source
  • A dmd-based subtraction method for scattering interference of dispersive afs light source

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0019] In order to make the object, technical solution and advantages of the present invention more clear, the present invention will be further described in detail below in conjunction with the examples. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0020] A kind of dispersion type AFS (atomic fluorescence spectrometer, atomic fluorescence spectrometer) light source scattering interference deduction method step based on DMD (Digital Micro-mirror Device, digital micromirror) of the present invention is as follows: see figure 2 with image 3 Shown:

[0021] Step 1. Determine the characteristic spectral line of the light source that the element to be measured can excite a strong non-resonant fluorescent line. This method adopts a narrow bandpass filter, because the existing narrow bandpass filter can only pass through the wavelength in the bandpass range, wherein the c...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the technical field of spectral analysis, and specifically relates to a DMD-based method for subtracting scattering interference of a dispersive AFS light source. The characteristic spectral line selects a narrow bandpass filter corresponding to the central wavelength and places it in front of the atomizer to ensure that only wavelengths within the bandpass range of the narrowband filter can pass through the excitation light source, and the corresponding resonance fluorescence and Non-resonant fluorescence; control the digital micromirror to perform full-spectrum measurement, confirm that the non-resonant fluorescent line information participating in the detection corresponds to the range of pixels on the digital micromirror; measure all non-resonant fluorescence intensities according to the range and sum them to obtain the fluorescence of the element to be measured strength value. It can effectively avoid light source scattering interference and improve the accuracy of the quantitative detection results of the elements to be measured.

Description

technical field [0001] The invention belongs to the technical field of spectrum analysis, and in particular relates to a DMD-based method for subtracting scattering interference of a dispersion-type AFS light source. Background technique [0002] When the atomic fluorescence spectrometer detects the analyte in the sample, due to the efficiency of the gas-liquid separator, there will be some incompletely vaporized aerosol particles and water vapor particles in the atomizer. Under normal circumstances, the excitation light source only excites the free atoms in the atomizer to generate fluorescence signals for detection, but due to the existence of aerosol particles and water vapor particles, the excitation light source will directly enter the detection system through scattering, which is confused with the generated fluorescence signals. This type of interference is called the light source scattering interference of the atomic fluorescence spectrometer; at the same time, since ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/64
CPCG01N21/6404G01N2021/6417
Inventor 田地王宏霞刘可李春生
Owner JILIN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products