A kind of porous polytetrafluoroethylene copper clad laminate and its preparation method
A polytetrafluoroethylene and polytetrafluoroethylene technology, which is applied in the field of porous polytetrafluoroethylene copper clad laminate and its preparation, can solve the problems affecting the application of PTFE copper clad laminate, lack of long-term effect of bonding, insufficient adhesion and the like , to achieve the effect of durable adhesion, low production cost and low dielectric constant
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Embodiment 1
[0042] A preparation method of porous polytetrafluoroethylene copper clad laminate, comprising the following steps:
[0043] (1) Grind and mix the silicon dioxide powder with a particle size of 0.1 μm and PTFE powder evenly, and lay the mixed powder, pure PTFE powder, and mixed powder evenly in order, and then sinter at high temperature and high temperature to form a three-layer structure of PTFE base film;
[0044] (2) The upper and lower surfaces of the PTFE-based film of the three-layer structure are mechanically polished to be smooth, and the epidermis is removed to expose the silicon dioxide particles;
[0045] (3) Soak the PTFE-based film with exposed silicon dioxide particles in an acid etching solution to dissolve the silicon dioxide particles on the surface, and obtain a porous PTFE-based film on the upper and lower surfaces;
[0046] (4) The porous PTFE-based film is treated with oxygen plasma for 800 seconds under the conditions of vacuum degree 20Pa and power 55 w...
Embodiment 2
[0059] A preparation method of porous polytetrafluoroethylene copper clad laminate, comprising the following steps:
[0060] (1) Grind and mix the silica powder with a particle size of 0.01 μm and PTFE powder evenly, and lay the mixed powder, pure PTFE powder, and mixed powder evenly in order, and then sinter at high temperature and high temperature to form a three-layer structure of PTFE base film;
[0061] (2) The upper and lower surfaces of the PTFE-based film of the three-layer structure are mechanically polished to be smooth, and the epidermis is removed to expose the silicon dioxide particles;
[0062] (3) Soak the PTFE-based film with exposed silicon dioxide particles in an acid etching solution to dissolve the silicon dioxide particles on the surface, and obtain a porous PTFE-based film on the upper and lower surfaces;
[0063] (4) The porous PTFE-based film is treated with oxygen plasma for 200 seconds under the conditions of vacuum degree 25Pa and power 70 watts;
...
Embodiment 3
[0072] A preparation method of porous polytetrafluoroethylene copper clad laminate, comprising the following steps:
[0073] (1) Grind and mix the silica powder with a particle size of 1000 μm and PTFE powder evenly, and lay the mixed powder, pure PTFE powder, and mixed powder evenly in order, and then sinter at high temperature and high temperature to form a three-layer structure of PTFE-based film;
[0074] (2) The upper and lower surfaces of the PTFE-based film of the three-layer structure are mechanically polished to be smooth, and the epidermis is removed to expose the silicon dioxide particles;
[0075] (3) Soak the PTFE-based film with exposed silicon dioxide particles in an acid etching solution to dissolve the silicon dioxide particles on the surface, and obtain a porous PTFE-based film on the upper and lower surfaces;
[0076] (4) The porous PTFE-based film is surface-treated with oxygen plasma for 10 seconds under a vacuum of 30 Pa and a power of 95 watts;
[0077...
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