The invention discloses a cleaning device for improving
wafer surface cleanliness and a using method thereof, and relates to the technical field of
semiconductor manufacturing, the cleaning device comprises a cleaning device main body, the bottom wall of the cleaning device main body is provided with a flushing liquid
backflow assembly, and the flushing liquid
backflow assembly comprises a liquid collecting tank installed on the bottom wall of the cleaning device main body; z-shaped filter plates which are arranged in a staggered manner are mounted in the liquid collecting tank; a first
backflow pipe is installed on the back face of the liquid collecting tank in a penetrating mode, a third mixed-flow pump is installed at one end of the first backflow
pipe, a second backflow
pipe is installed at one end of the third mixed-flow pump, and a backflow box is installed at one end of the second backflow pipe in a penetrating mode; the bottom of the liquid collecting tank is inclined, the inner wall of the liquid collecting tank is made of
polytetrafluoroethylene materials, and the inner wall of the liquid collecting tank is coated with a nanometer
coating. By installing the flushing liquid backflow
assembly on the bottom wall of the cleaning device body, the problems that in an existing cleaning device, the cleaning liquid recycling efficiency is low,
impurity filtering is insufficient, the cleaning
liquid waste treatment cost is high, and the environment is polluted can be solved.