A non-destructive splitting method for improving the brightness of LED die
A technology of LED chips and brightness, which is applied in the manufacture of semiconductor devices, electrical components, semiconductor/solid-state devices, etc. It can solve the problems that the chips cannot be completely cut without damage, and achieve the effect of improving the light output efficiency and retaining the light-emitting area
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0053] A non-destructive split method for improving the brightness of the LED tube core of the present invention, specifically comprises the following steps:
[0054] (1) Apply a protective film, adsorb the chip on the suction cup of the homogenizer, set the speed at 6000r / min, and the thickness of the protective film at 19000Å.
[0055] (2) Light exposure, the light intensity is 6.5, and the exposure time is 10s.
[0056] (3) For film drying, the temperature of the oven is set at 98°C for 10 minutes.
[0057] (4) The concentration of developing etching solution is 4.5%, the etching time is controlled at 25s, and the etching groove width is 6 μm.
[0058] (5) Cleaning is to rinse the chip with pure water for 500-510 seconds, and dry it with hot nitrogen for 9-11 minutes.
[0059] (6) For ICP etching, the gases fed are 100 sccm and 50 sccm each, the chamber pressure is 6 Torr, the ICP RF power is 300w, the BIAS RF power is 300w, and the tray temperature is 45°C.
[0060] Fur...
Embodiment 2
[0067] According to the non-destructive splitting method for improving the brightness of the LED tube core described in Embodiment 1, the difference is that
[0068] In the step (1), the set speed of the homogenizer is 6500r / min, and the thickness of the protective film is 18500Å.
[0069] The light intensity in the step (2) is 7, and the exposure time is 8s.
[0070] In the step (3), the film drying temperature is 95° C., and the drying time is 11 minutes.
Embodiment 3
[0072] According to the non-destructive splitting method for improving the brightness of the LED tube core described in Embodiment 1, the difference is that
[0073] The gas introduced in the step (6) is CL 2 、BCl 3 , the contents of which are respectively 80 sccm, the chamber pressure is 6 Torr, the ICP RF power is 400w, the BIAS RF power is 400w, and the tray temperature is 40°C.
[0074] Further, the depth of ICP etching is 85% of the chip thickness.
[0075] In the step (7), the masking film is removed, and the chip etched by ICP is placed in acetone and ethanol organic solvents successively. The temperature of acetone is 50° C. for 4 minutes, and the temperature of ethanol is 70° C. for 4 minutes.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com