Induction type plasma acceleration device and method
A plasma and acceleration device technology, applied in the field of plasma acceleration devices, can solve the problems of restricting the practical application of devices, heat dissipation, system complexity, and reducing system efficiency, so as to achieve the best long-life operation potential, reduce system complexity, and reduce interaction The effect of crosstalk
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Embodiment 1
[0057] figure 1 Shown is the first implementation structure of an inductive plasma accelerator in this embodiment, which includes:
[0058] A pulsed laser component 1 is used to generate a pulsed laser 11. In this embodiment, a pulsed laser or other equipment capable of emitting pulsed laser is used as the pulsed laser component 1;
[0059] The pulse discharge component is composed of a pulse switch 21 and an energy storage capacitor 22 electrically connected to perform pulse discharge; wherein, the pulse switch 21 is a pulse switch or a switch array with a high peak current, and the high voltage end of the pulse switch 21 adopts a high temperature resistant Epoxy resin is integrally packaged to improve its insulation performance when used in a near-vacuum environment; the energy storage capacitor 22 is used to store discharge energy, and the terminal of the energy storage capacitor 22 adopts a packaged structure to improve the insulation performance used in a vacuum environme...
Embodiment 2
[0066] image 3 Shown is the second implementation structure of an inductive plasma accelerator in this embodiment, which includes a pulse laser assembly 1, a pulse discharge assembly, and an excitation coil assembly 3 with the same function and structure as the first implementation structure , solid-state working medium 4 and control assembly 5; it also includes a reflective assembly arranged on the optical path of the pulsed laser light 11 emitted by the pulsed laser assembly 1, so that the laser light can be accurately irradiated on the solid-state working medium 4 according to a predetermined intensity distribution superior. The difference from the first implementation structure is that the excitation coil assembly 3 in the second implementation structure is formed by overlapping multiple helical antennas in an axisymmetric manner. Preferably, the single helical antenna is specifically A Kimedean spiral line type, that is, if Figure 4 A single helical antenna and an exc...
Embodiment 3
[0074] Figure 6 Shown is the third implementation structure of an inductive plasma accelerator in this embodiment, which includes a pulse laser assembly 1, a pulse discharge assembly, and an excitation coil assembly 3 with the same function and composition as the first implementation structure , solid-state working medium 4 and control assembly 5; it also includes a reflective assembly arranged on the optical path of the pulsed laser 11 emitted by the pulsed laser 11 assembly 1, so that the laser can be accurately and uniformly irradiated on the solid-state working medium 4 . Wherein, the specific implementation structure of the excitation coil assembly 3 in the third implementation structure is the same as that in the second implementation structure.
[0075] The inductive plasma acceleration device also includes a bracket assembly, the bracket assembly includes a support base frame 72 and a tower tube 73 arranged on the support base frame 72, the exciting coil assembly 3 i...
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