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Photoetching mask plate defect detection method and equipment and chip

A technology of defect detection and lithography mask, which is applied in the field of lithography, can solve the problems of increased detection cost and low detection efficiency, and achieve the effect of low detection cost

Pending Publication Date: 2020-06-09
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The existing detection methods for mask defects rely on expensive testing machines and additional process steps for auxiliary detection, which greatly increases the detection cost and low detection efficiency

Method used

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  • Photoetching mask plate defect detection method and equipment and chip
  • Photoetching mask plate defect detection method and equipment and chip
  • Photoetching mask plate defect detection method and equipment and chip

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Embodiment Construction

[0034] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0035] Words such as "exemplary" or "for example" mentioned in this embodiment are used as examples, illustrations or illustrations, and are intended to present related concepts in a specific manner, and should not be interpreted as being more accurate than other embodiments or design solutions. preferred or more advantageous.

[0036] The method provided in the embodiment of the present application is applied to a photomask plate defect detection syste...

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Abstract

The invention discloses a photoetching mask plate defect detection method and equipment and a chip, relates to the technical field of photoetching, and aims to improve the defect detection accuracy while increasing the detection speed and reducing the defect detection cost of a mask plate. The photoetching mask plate defect detection method comprises the following steps: acquiring photoetching projection of a to-be-detected mask plate to form space image distribution; and detecting the space image distribution of the to-be-detected mask plate by using a defect machine learning model to obtainthe defect information of the photoetching mask plate. The photoetching mask defect detection equipment is used for executing the photoetching mask plate defect detection method. The photoetching maskplate defect detection method is used for detecting mask plate defects.

Description

technical field [0001] The invention relates to the technical field of photolithography, in particular to a defect detection method, equipment and chip of a photolithography mask plate. Background technique [0002] In the integrated circuit manufacturing process, pattern transfer lithography is one of the key steps. At present, it has been developed to use extreme ultraviolet lithography (Extreme Ultraviolet Lithography, abbreviated as EUV) for photolithography. EUV uses a light source with a wavelength as short as 13.5nm. Both the optical system and the reticle are forced to be reflective, and the projection objective lens is also in the form of a non-telecentric object. However, in the manufacturing process of the EUV lithography mask plate, the existence of defects in the EUV lithography mask is inevitable, and the defect of the EUV lithography mask seriously affects the yield of chip production, and it is not yet possible to realize the Fabrication of defect masks. T...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/88G06T7/00H01L21/66
CPCG01N21/88G01N21/8851H01L22/12G06T7/0004G01N2021/8887G01N2021/8883G06T2207/20081G06T2207/20084G06T2207/30148
Inventor 陈颖韦亚一董立松陈睿吴睿轩粟雅娟
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI