Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Substrate

一种对向基板、基板的技术,应用在辨认装置、仪器、光学元件等方向,能够解决混光及开口率不足、遮光能力不足等问题,达到避免开口率不足、改善混光、佳遮光能力的效果

Active Publication Date: 2022-02-22
AU OPTRONICS CORP
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The present invention provides an opposite substrate, which can improve the problems of insufficient light-shielding ability, light mixing and insufficient aperture ratio, etc.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Substrate
  • Substrate
  • Substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0061] Reference will now be made in detail to the exemplary embodiments of the present invention, examples of which are illustrated in the accompanying drawings. Wherever possible, the same reference numbers will be used in the drawings and description to refer to the same or like parts.

[0062] The directional terms mentioned in the embodiments, such as "up", "down", "front", "rear", "left", "right", etc., are only referring to the directions of the drawings. Accordingly, the directional terms used are illustrative, not limiting, of the invention. In the drawings, each figure illustrates the general characteristics of methods, structures and / or materials used in particular embodiments. However, these figures should not be interpreted as defining or limiting the scope or nature encompassed by these embodiments. For example, the relative sizes, thicknesses and positions of layers, regions and / or structures may be reduced or exaggerated for clarity. It will be understood th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an opposite substrate, which includes a substrate, a plurality of first light-shielding patterns, a plurality of second light-shielding patterns, a flat layer and a plurality of supporting pieces. The plurality of supports are located in the plurality of primary support regions and the plurality of secondary support regions of the opposing substrate. The plurality of first light-shielding patterns respectively extend along the first direction, wherein materials of the plurality of first light-shielding patterns include organic materials. The plurality of second light-shielding patterns respectively extend along the second direction, wherein the material of the plurality of second light-shielding patterns includes metal. The plurality of first light-shielding patterns and the plurality of second light-shielding patterns are respectively located on opposite sides of the planar layer. Alternatively, the plurality of first light-shielding patterns and the plurality of second light-shielding patterns are located on the same side of the planar layer, and the planar layer has a plurality of openings respectively overlapping the plurality of supports located in the plurality of secondary support regions.

Description

technical field [0001] The invention relates to a counter substrate, and in particular to a counter substrate suitable for a display. Background technique [0002] With the advancement of technology, the demand for displays with high resolution is getting higher and higher. Taking a Head Mounted Display (HMD) as an example, it utilizes a lens group to project a display image into human eyes, allowing the user to see a magnified virtual image. In order to achieve the immersion of Virtual Reality (VR) and improve the detail of images, the resolution of the head-mounted display needs to be above 1000PPI (Pixel Per Inch). However, limited by the current manufacturing process technology, manufacturing process limits and material characteristics, the light-shielding pattern of the opposite substrate in the display may be poorly produced with the increase of resolution, resulting in insufficient light-shielding ability, light mixing and insufficient aperture ratio. And other issu...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G09F9/30G02F1/1335G02B27/01
CPCG09F9/30G02F1/133512G02B27/0172H10K59/8792G06F3/0412G06F3/0446G06F3/0445G02F1/133357G02F1/13394H10K59/38H10K59/40G02F1/13338G02F1/133514G02F1/136286G06F3/041G06F2203/04103G06F2203/04107
Inventor 吕思慧叶家宏黄国有
Owner AU OPTRONICS CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products