Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Plain weave fabric with hidden shadow pattern and weaving method thereof

A plain weave, shadow technology, applied in textiles and papermaking, textiles, fabrics, etc., can solve problems such as difficulty, and achieve the effect of clear and subtle patterns and similar effects

Active Publication Date: 2022-04-08
吴忠恒和织造科技有限公司
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But it is not easy to add icing on the cake in plain weave

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Plain weave fabric with hidden shadow pattern and weaving method thereof
  • Plain weave fabric with hidden shadow pattern and weaving method thereof
  • Plain weave fabric with hidden shadow pattern and weaving method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0075] The present invention will be further described in detail below in conjunction with the accompanying drawings and examples. The following examples are explanations of the present invention and the present invention is not limited to the following examples.

[0076] Such as figure 1 As shown, the first warp yarn T of the plain weave area A of the two warp yarns with the same tension 1 and the second warp yarn T 2 Even tension, the first weft W 1 and the second weft yarn W 2 Arranged evenly, the first warp yarn T of the plain weave area B with two warp yarns one tight and one loose 1 High tension, second warp T 2 Small tension, the first weft W 1 and the second weft yarn W 2 Therefore, the high and low arrangement is formed, thereby forming the plain weave area A with the same tension of two warp yarns and the plain weave area B with two warp yarns one tight and one loose, so that the visual difference can be formed by contrast and a hidden shadow pattern can be for...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a plain weave cloth with a hidden shadow pattern and a weaving method thereof, belonging to the technical field of textiles. It is a plain weave fabric that uses the difference in warp tension, one tight and one loose, so that the weft yarn is high and the weft yarn is high and the weft yarn is low, compared with the area where the warp yarn tension is balanced and the weft yarn is flat, forming an invisible shadow pattern. A weaving method of plain weave cloth with hidden shadow pattern, including the weaving method of the area where one is tight and the other is loose so that the weft yarn is high and the weft is low by using the warp tension difference, and the weaving method is the weaving of the area where the warp tension is balanced and the weft is flat method. Although the present invention is plain weave cloth with one up and one down plain weave, it can have a faint jacquard small pattern, and patterns such as trademarks and drawing numbers can be integrated into the plain weave without dyeing, which is very popular in the market.

Description

technical field [0001] The invention relates to a plain weave cloth, in particular to a plain weave cloth with a hidden shadow pattern and a weaving method thereof, belonging to the technical field of textiles. Background technique [0002] Plain weave is the fabric with the widest range, the largest quantity, the most mature technology and the longest history in the textile field. It is very popular in the market because it is simple to weave up and down, durable and durable. But it is not easy to add icing on the cake in plain weave. People are constantly exploring, unless it is how to make the fabric particles plump, thick and soft. Or it is to use the different warp twist directions to form strip-shaped hidden shadow strips and grids. Or use different batch numbers to form bars or grids. People are extravagantly looking forward to whether there are small jacquards and small patterns in the plain weave in addition to yarn-dyed and printing, making the plain weave more...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): D03D13/00
CPCD03D13/00
Inventor 邵力群许国栋
Owner 吴忠恒和织造科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com