A data processing system and method
A data processing system and data processing technology, applied in the direction of originals for photomechanical processing, microlithography exposure equipment, instruments, etc., can solve problems such as multi-time and cost
Active Publication Date: 2021-09-10
YANGTZE MEMORY TECH CO LTD
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When the higher priority tasks are processed, the lower priority tasks are reprocessed, resulting in more time-consuming
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[0029] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings.
[0030] In the following description, a lot of specific details are set forth in order to fully understand the present invention, but the present invention can also be implemented in other ways different from those described here, and those skilled in the art can do it without departing from the meaning of the present invention. By analogy, the present invention is therefore not limited to the specific examples disclosed below.
[0031] Optical proximity effect correction is to correct the optical proximity effect by pre-distorting the pattern during mask design, so that the circuit pattern that meets the design requirements can be obtained after photolithography. The optical proximity effect means that with the continuous development o...
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The present invention provides a data processing system and method for processing the first optical proximity effect correction task, the first optical proximity effect correction task includes: a first subtask and a second subtask, and the system includes: a first processing unit and a second subtask Two processing units. The first processing unit is used for processing the first subtask, and the second processing unit is used for processing the second subtask. When receiving the second optical proximity effect correction task and the priority of the second optical proximity effect correction task is greater than the priority of the first optical proximity effect correction task, the first processing unit stops processing the first subtask and processes the second optical proximity effect correction task. Proximity Effect Correction Task. When the first processing unit stops processing the first subtask, the second processing unit processes the second subtask and the unprocessed part of the first subtask. When a higher-priority task is received, the higher-priority correction task and the lower-priority correction task can be processed simultaneously, saving time for optical proximity effect correction.
Description
technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a data processing system and method. Background technique [0002] Photolithography technology is a crucial technology in semiconductor manufacturing technology, which can realize the transfer of graphics from the mask to the surface of the silicon wafer to form semiconductor products that meet the design requirements. With the continuous shrinking of the design size, the design size is close to or smaller than the wavelength of light used in the lithography process, and the diffraction effect and interference effect of light become more and more obvious, resulting in the actual formation of the lithography pattern relative to the mask plate. The pattern is seriously distorted, and finally the actual pattern formed by photolithography on the silicon wafer becomes different from the design pattern. This phenomenon is called the optical proximity effect (Optical...
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IPC IPC(8): G03F7/20G03F1/36
CPCG03F1/36G03F7/70441G03F7/70508
Inventor 张雷
Owner YANGTZE MEMORY TECH CO LTD