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An optical detection device for improving the uniformity of mocvd spraying

An optical detection and uniformity technology, applied in the field of optical detection, can solve problems such as uneven spraying and inability to control in real time, and achieve the effects of improving stability, simple and convenient detection methods, and accurate and efficient measurement results.

Active Publication Date: 2021-12-31
HUAZHONG UNIV OF SCI & TECH
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  • Abstract
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Problems solved by technology

[0004] In view of the above defects or improvement needs of the prior art, the present invention provides an optical detection device for improving the spray uniformity of MOCVD, wherein the optical detection feedback control unit is set in the MOCVD equipment to detect the spray in the growth reaction unit in real time. The distribution of the density field in the shower area, and according to the test results, the sprinkler head is adjusted to achieve uniform spraying, which solves the problems of uneven spraying and inability to control in real time in the existing sprinkler head

Method used

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[0024] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not constitute a conflict with each other.

[0025] An optical detection device and method for improving the uniformity of MOCVD spraying, comprising: a vertical spraying MOCVD growth reaction chamber and an optical detection feedback control device;

[0026] The vertical spray MOCVD growth reaction chamber includes a reaction chamber 11, a gas inlet 5, a base 1, a heater 10, a coolant inlet 3, and a gas outlet 12; the optical detection fe...

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Abstract

The invention belongs to the technical field of optical detection, and discloses an optical detection device for improving the uniformity of MOCVD spraying. The device includes a growth reaction unit and an optical detection feedback control unit. The growth reaction unit includes a reaction chamber, a shower head, a base and a heater. After the gas enters the shower head from the air inlet, it is sprayed out from the shower head. The decomposition reaction occurs on the heated substrate; the optical detection feedback control unit is used to detect the density distribution field of the gas ejected from the shower head, including the light source, camera and parabolic mirror. After the shower head is ejected, the light in the area with more gas distribution is refracted by the ejected gas and cannot return to the original path, forming a darker area in the camera imaging, and other light rays return to the original path to form a brighter area in the camera imaging , so as to obtain the density distribution of the ejected gas. The present invention solves the problems of uneven spraying, incapable of real-time control and the like.

Description

technical field [0001] The invention belongs to the technical field related to optical detection, and more specifically relates to an optical detection device for improving the uniformity of MOCVD spraying. Background technique [0002] In today's era, semiconductor technology has continuously made breakthroughs, which has also promoted the development of new materials and new devices. Among them, GaN thin film materials, as the representative of the third-generation semiconductors, are due to their excellent thermal stability and wide range of optical and electrical properties. It is widely used in the manufacture of high-power, high-frequency and high-voltage electronic devices. However, with the rapid development of semiconductor materials and microelectronics technology, the demand for thin film materials is getting higher and higher, which puts forward higher requirements for the growth and preparation technology of thin films. Metal Organic Chemical Vapor Deposition (...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/52G01N21/45G01N21/01
CPCC23C16/52G01N21/455G01N21/01
Inventor 方海生陈浩高仙仙聂圻春
Owner HUAZHONG UNIV OF SCI & TECH
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