Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Sliding rail gap eliminating structure

A sliding rail and clearance technology is applied in the field of sliding rail clearance elimination structure, which can solve the problems of inconvenient assembly, unreasonable structure design, complex structure, etc.

Pending Publication Date: 2021-07-06
诺创汽车科技(上海)有限公司
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the unreasonable structural design, the existing gap elimination structure has many parts, complex structure, high cost, and is not easy to assemble, and the gap elimination effect between the upper and lower rails is poor, and it cannot effectively avoid abnormalities. loud happening

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Sliding rail gap eliminating structure
  • Sliding rail gap eliminating structure
  • Sliding rail gap eliminating structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0038] It should be noted that the features in the present invention in the present invention can be combined with each other in the case of an unable conflict.

[0039] In the description of the present invention, it is to be noted that the orientation or positional relationship indicated by the terms "upper", "lower", "top", "bottom", etc. is based on the orientation or positional relationship shown in the drawing, is only for It is easy to describe the invention and simplified description, rather than indicating or implying that the device or element must have a specific orientation, and is not understood to limit the limitations of the invention. Moreover, the term "first", "second" is used only for the purpose, and cannot be understood as an indication or implies relative importance.

[0040] In addition, it is to be noted that the elimination gap of the present embodiment specifically refers to between the upper slide and the lower slide between the vertical directions of ze...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a sliding rail gap eliminating structure which is arranged between an upper sliding rail and a lower sliding rail, a locking part is arranged between the upper sliding rail and the lower sliding rail, the sliding rail gap eliminating structure comprises two abutting parts, a lever part and an elastic part, the two abutting parts are oppositely arranged on the two sides of the lower sliding rail, and each abutting part extends in the length direction of the long sliding rail; the at least one group of lever parts are arranged on the upper sliding rail, each group of lever parts comprises two lever parts which are oppositely arranged on the two sides of the upper sliding rail, each lever part is provided with a force bearing end and a pushing end which are oppositely arranged, the elastic parts are arranged between the force bearing ends of the lever parts on the sides and the upper sliding rail, and the elastic parts can abut against the force bearing ends. Therefore, the pushing end is tilted to abut against the abutting part. The upper sliding rail and the lower sliding rail can be kept to abut against each other in the vertical direction. Meanwhile, centering arrangement of the upper sliding rail and the lower sliding rail can be kept in the horizontal direction, therefore, a gap between the upper sliding rail and the lower sliding rail can be effectively eliminated, abnormal sound can be effectively prevented, and the sliding rail is simple in structure and convenient to assemble.

Description

Technical field [0001] The present invention relates to the field of vehicle seat techniques, and more particularly to a slide gap elimination structure that can be applied to the vehicle seat slide. Background technique [0002] Vehicle seat rails typically include upper slide rails and lower sliding rails, wherein the lower slide is connected to the body floor, and the upper rail can slide along the slide to regulate the position of the vehicle seat and between the upper slide and the lower slide rail. With a locking portion, the locking portion can realize the locking of the upper slide and down slide. At present, for seat rails for travel, the lower slide length is long, and the accuracy control is poor, so that there is an excessive gap between the upper slide and the lower slide, resulting in an abnormal sound. Therefore, there is generally configured with a slide rail gap elimination structure between the long rails. However, due to unreasonable structural design, existing...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B60N2/07B60N2/08
CPCB60N2/0722B60N2/08
Inventor 徐海祥周俊孙继国陈通周安明赵丹
Owner 诺创汽车科技(上海)有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com