A method of forming gratings
A grating and step-shaped technology, applied in the field of forming gratings, can solve the problem of not having the ability of grating change checking and contouring, etc.
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[0028] Embodiments of the present disclosure generally relate to methods of forming gratings. The method includes depositing a resist material over a grating material disposed on a substrate, patterning the resist material into a resist layer, projecting a first ion beam onto a first element region to form a first plurality of gratings, and projecting A second ion beam is directed to the second element region to form a second plurality of gratings. Utilizing a patterned resist layer allows projecting an ion beam over a large area, which is often easier than focusing the ion beam in a specific area. The element angles of the patterned resist facilitate ion etching for ion beam angles that are similar to the element angles of the patterned resist layer. Other areas are less likely to be patterned because the angle of the ion beam does not match the angle of the elements of the patterned resist. Elements of the present disclosure can facilitate, but are not limited to, forming ...
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