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A method of forming gratings

A grating and step-shaped technology, applied in the field of forming gratings, can solve the problem of not having the ability of grating change checking and contouring, etc.

Active Publication Date: 2021-07-23
APPLIED MATERIALS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Furthermore, some lithographic methods do not have the capability to fabricate variation detection and profiles of gratings in different waveguides

Method used

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  • A method of forming gratings
  • A method of forming gratings
  • A method of forming gratings

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Experimental program
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Embodiment Construction

[0028] Embodiments of the present disclosure generally relate to methods of forming gratings. The method includes depositing a resist material over a grating material disposed on a substrate, patterning the resist material into a resist layer, projecting a first ion beam onto a first element region to form a first plurality of gratings, and projecting A second ion beam is directed to the second element region to form a second plurality of gratings. Utilizing a patterned resist layer allows projecting an ion beam over a large area, which is often easier than focusing the ion beam in a specific area. The element angles of the patterned resist facilitate ion etching for ion beam angles that are similar to the element angles of the patterned resist layer. Other areas are less likely to be patterned because the angle of the ion beam does not match the angle of the elements of the patterned resist. Elements of the present disclosure can facilitate, but are not limited to, forming ...

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Abstract

Embodiments of the disclosure generally relate to methods of forming gratings. The method includes depositing a resist material on a grating material disposed over a substrate, patterning the resist material into a resist layer, projecting a first ion beam to the first device area to form a first plurality of gratings, and projecting a second ion beam to the second device area to form a second plurality of gratings. Using a patterned resist layer allows for projecting an ion beam over a large area, which is often easier than focusing the ion beam in a specific area.

Description

technical field [0001] Embodiments of the present disclosure relate generally to a method, and more particularly to a method of forming a grating. Background technique [0002] Virtual reality is generally considered to be a computer-generated simulated environment in which the user has a distinct physical presence. A virtual reality experience can be generated in 3D and viewed through a head-mounted display (HMD), such as glasses or other wearable display devices with a near-eye display panel as a lens, to display a virtual reality environment that replaces the real environment . [0003] Augmented reality, however, enables an experience in which the implementer can still view the surrounding environment through the display lenses of glasses or other HMD devices, and can also see images of virtual objects that are generated for display and appear as part of the environment. Augmented reality can include any type of input, such as audio and tactile input, as well as virtua...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B27/42G02B27/01G02B30/00
CPCB29D11/00769C23C14/221C23C14/54C23C14/562C23C14/568G02B3/0018G02B5/1857G02B6/0065G02B27/0172G03F7/2032G03F7/2065G03F7/24H01J37/305H01J37/31H01J37/317G02B27/42G02B30/00G02B6/0016G03F7/001G03F7/16G03F7/2002
Inventor 约瑟夫·C·奥尔森卢多维克·戈代罗格·梅耶·蒂默曼·蒂杰森摩根·埃文斯傅晋欣
Owner APPLIED MATERIALS INC