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A method for diagnosing control performance of a semiconductor process batch-to-batch control system

A control system and control performance technology, applied in general control systems, control/regulation systems, test/monitoring control systems, etc., can solve problems such as difficult to determine control performance degradation

Active Publication Date: 2022-05-27
ZHENGZHOU UNIVERSITY OF LIGHT INDUSTRY
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Problems solved by technology

[0005] In order to monitor the control performance of the EWMA inter-batch controller and diagnose the cause of performance degradation, the present invention proposes a method for diagnosing the control performance of the inter-batch control system of the semiconductor process to solve the problem that the existing control performance monitoring method is difficult to determine the specific degradation of control performance. factor technical issues

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  • A method for diagnosing control performance of a semiconductor process batch-to-batch control system
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  • A method for diagnosing control performance of a semiconductor process batch-to-batch control system

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specific example 1

[0206] Chemical-mechanical planarization (CMP) is the planarization method chosen by the semiconductor industry today. figure 2 shown. In 1989, Davari et al. developed the CMP method for global planarization of interlayer dielectrics. In the early 1990s, IBM successfully used the CMP process to deal with the slow dry etching of copper. In addition, CMP has been integrated with double Damaskin to simplify the fabrication steps of conductive lines between successive layers of multilayer integrated circuits. As wafer sizes increase to 300 mm or more, equipment and process designs improve to address these issues. In addition, due to the increasing demand for high-performance products in the fierce semiconductor market, the quality of semiconductor products is becoming more and more important with the increase of manufacturers. This example uses a simulated CMP process. The discrete model of the CMP process is described as follows:

[0207]

[0208] Among them, θ=0.65, ε(t...

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Abstract

The present invention proposes a method for diagnosing the control performance of a batch-to-batch control system in a semiconductor manufacturing process. First, according to the closed-loop data of the historical normal working conditions and the closed-loop data of the actual working conditions, the white noise of the reference working condition, the disturbance model of the reference working condition, and the reference working condition are estimated. model residuals, actual working condition white noise, actual working condition disturbance model and actual working condition model residuals; secondly, according to the reference working condition white noise and its model residuals, actual working condition white noise and its model residuals to obtain four According to the closed-loop data of historical normal working conditions, the control performance monitoring quantity and the upper control limit / lower limit of the four diagnostic monitoring quantities are obtained; finally, the inter-batch control system is evaluated according to the control performance monitoring quantity and its upper control limit / lower limit. control performance. The invention not only correctly evaluates the control performance of the closed-loop system under the normal operating conditions of the semiconductor manufacturing process, but also can effectively diagnose the cause of system performance degradation, reduces the cost of system maintenance, and improves system security.

Description

technical field [0001] The invention belongs to the field of control performance evaluation and diagnosis of process industrial control systems, and in particular relates to a control performance diagnosis method of a semiconductor process batch control system, which is used for evaluating the control performance of the batch control system in the semiconductor process and diagnosing the deterioration of the control performance. reason. Background technique [0002] In recent years, with the huge market demand, abundant human resources and many other advantages, my country's semiconductor industry has achieved rapid development and has become the focus of the global integrated circuit industry. The level of my country's semiconductor industry is still extremely disproportionate to my country's status as a great power. For example, high-tech companies in Zhongguancun occupy most of the domestic computer market share, but their profit margin is only about 3%, while the net pr...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G05B23/02
CPCG05B23/0243G05B2219/24065
Inventor 凌丹栗朝松王妍孙军伟王英聪郭群力王延峰张勋才刘鹏姜素霞
Owner ZHENGZHOU UNIVERSITY OF LIGHT INDUSTRY
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