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Control performance diagnosis method for semiconductor process batch-to-batch control system

A control system and control performance technology, applied in general control systems, control/regulation systems, testing/monitoring control systems, etc., and can solve problems such as difficulty in determining control performance degradation

Active Publication Date: 2021-07-30
ZHENGZHOU UNIVERSITY OF LIGHT INDUSTRY
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Problems solved by technology

[0005] In order to monitor the control performance of the EWMA inter-batch controller and diagnose the cause of performance degradation, the present invention proposes a method for diagnosing the control performance of the inter-batch control system of the semiconductor process to solve the problem that the existing control performance monitoring method is difficult to determine the specific degradation of control performance. factor technical issues

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  • Control performance diagnosis method for semiconductor process batch-to-batch control system
  • Control performance diagnosis method for semiconductor process batch-to-batch control system
  • Control performance diagnosis method for semiconductor process batch-to-batch control system

Examples

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specific example 1

[0206] Chemical-mechanical polishing (CMP) is the planarization method of choice in the semiconductor industry today such as figure 2 shown. In 1989, Davari et al. developed the CMP method for global planarization of interlayer dielectrics. In the early 1990s, IBM successfully used the CMP process to deal with the slow dry etching of copper. In addition, CMP has been integrated with the dual Damascus gold process to simplify the fabrication steps of conductive lines between successive layers of multilayer integrated circuits. As wafer sizes increase to 300 mm or more, equipment and process design improvements are made to address these issues. In addition, due to the increasing demand for high-performance products in the fierce semiconductor market, the quality of semiconductor products is becoming more and more important as the number of manufacturers increases. This example uses a simulated CMP process. The discrete model of the CMP process is described as follows:

[...

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Abstract

The invention provides a control performance diagnosis method for a semiconductor process batch-to-batch control system, and the method comprises the steps: firstly, according to the closed-loop data of a historical normal working condition and the closed-loop data of an actual working condition, estimating reference working condition white noise, a reference working condition disturbance model, a reference working condition model residual error, actual working condition white noise, an actual working condition disturbance model and an actual working condition model residual error; secondly, obtaining four diagnosis monitoring quantities according to the reference working condition white noise and the model residual error thereof, and the actual working condition white noise and the model residual error thereof, and obtaining a control performance monitoring quantity and a control upper limit / lower limit of the four diagnosis monitoring quantities according to closed-loop data of a historical normal working condition; and finally, evaluating the control performance of the inter-batch control system according to the control performance monitoring quantity and the control upper limit / lower limit thereof. According to the method, the control performance of the closed-loop system is correctly evaluated under the conventional operation condition of the semiconductor manufacturing process, the reason causing the performance reduction of the system can be effectively diagnosed, the maintenance cost of the system is reduced, and the safety of the system is improved.

Description

technical field [0001] The invention belongs to the field of control performance evaluation and diagnosis of process industry control systems, in particular to a method for diagnosing control performance of inter-batch control systems in semiconductor manufacturing processes, which is used to evaluate the control performance and diagnose control performance degradation of inter-batch control systems in semiconductor manufacturing processes reason. Background technique [0002] In recent years, relying on many advantages such as huge market demand and abundant human resources, my country's semiconductor industry has achieved rapid development, and has become the focus of attention of the global integrated circuit industry. The level of my country's semiconductor industry is still extremely disproportionate to our country's status as a major country. For example, the high-tech enterprises in Zhongguancun occupy most of the domestic computer market, but their profit margin is ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G05B23/02
CPCG05B23/0243G05B2219/24065
Inventor 凌丹栗朝松王妍孙军伟王英聪郭群力王延峰张勋才刘鹏姜素霞
Owner ZHENGZHOU UNIVERSITY OF LIGHT INDUSTRY
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