Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Surface anti-static dust removal device for fabric processing

A dust removal device and anti-static technology, applied in the direction of static electricity, electrical components, cleaning methods and appliances, etc., can solve the problems of small contact area, poor cleaning effect, poor effect of static guidance and dissipation, etc., to ensure stable fit , easy to separate, improve the effect of dust removal efficiency

Inactive Publication Date: 2022-06-28
ANHUI HENGYI TEXTILE TECH CO LTD
View PDF6 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This device can only clean one side of the fabric when cleaning the fabric, and the cleaning effect is relatively poor. The dust and impurities accumulated on the cleaning mechanism during the cleaning process cannot be removed in time. When working continuously, the cleaning effect gradually declines. When carrying out anti-static treatment, the contact area with the fabric is small, and the effect of guiding and dissipating static electricity is poor

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Surface anti-static dust removal device for fabric processing
  • Surface anti-static dust removal device for fabric processing
  • Surface anti-static dust removal device for fabric processing

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0025] see Figure 2-Figure 7 , In the embodiment of the present invention, the surface anti-static dust removal device for fabric processing includes a conveying table 1, a cleaning mechanism is fixedly connected to one side of the top of the conveying table 1, and the cleaning mechanism includes a support frame 2, and the inner wall of the support frame 2 is rotatably connected with up and down The guide rollers 3 and the cleaning r...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The surface anti-static dust removal device for fabric processing comprises a conveying table, one side of the top of the conveying table is fixedly connected with a cleaning mechanism, the cleaning mechanism comprises a supporting frame, and the inner wall of the supporting frame is rotationally connected with a guide rotating roller and a cleaning rotating roller which are arranged up and down; a plurality of dust removal sheets are fixedly connected to the surface of the cleaning rotating roller; a conductive plate is fixedly mounted in the middle of the conveying table, and conductive sheets are fixedly connected to the edges of the two sides of the conductive plate; a plurality of dust removal pieces are fixedly connected to the surface of the cleaning rotating roller, and the dust removal pieces rub one side of the cleaning rotating roller, so that wiping and dust removal on one side of a fabric are achieved; and meanwhile, the roller cleaning piece is arranged to clean dust and impurities on the dust removal pieces, and the problem that the dust removal effect is reduced due to the fact that too much dust and impurities adhere to the dust removal pieces after long-time work is effectively solved.

Description

technical field [0001] The invention relates to the technical field of textile equipment, in particular to a surface anti-static dust removal device for fabric processing. Background technique [0002] In the process of fabric processing and production, anti-static and dust removal treatment on the fabric can facilitate subsequent processing operations and improve the quality of the finished fabric. [0003] like figure 1 The shown is an anti-static dust removal device for fabrics, which uses a cleaning brush in a cleaning mechanism to remove dust and clean the fabric, and uses a conductive roller to guide and dissipate static electricity on the fabric. This device can only clean one side of the fabric when cleaning the fabric, and the cleaning effect is poor. The dust and impurities accumulated on the cleaning mechanism during the cleaning process cannot be removed in time. When working continuously, the cleaning effect gradually declines. When anti-static treatment is pe...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): D06G1/00H05F3/02B08B1/04B08B5/02
CPCD06G1/00H05F3/02B08B5/02B08B1/32
Inventor 宋明起李贺
Owner ANHUI HENGYI TEXTILE TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com