Exposure control method, shooting processing method, device and medium

A technology of exposure control and exposure parameters, applied in the field of image processing, can solve the problems of low image shooting quality and low exposure control accuracy, and achieve the effects of improving shooting quality, improving brightness effect, and overcoming dark images

Active Publication Date: 2022-07-22
SHENZHEN MICROBT ELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this way, when the actual ambient brightness exceeds the dynamic range, the statistical results of the ambient brightness often do not match the actual ambient brightness, resulting in low accuracy of exposure control, which in turn leads to low image quality

Method used

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  • Exposure control method, shooting processing method, device and medium
  • Exposure control method, shooting processing method, device and medium
  • Exposure control method, shooting processing method, device and medium

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0069] refer to figure 2 , showing a schematic flowchart of the steps of an exposure control method according to an embodiment of the present application, and the method may specifically include the following steps:

[0070] Step 201: Determine a first captured image group and a first standard dynamic range image corresponding to the first exposure parameter; wherein, the first standard dynamic range image may include: sequentially performing high dynamic image synthesis processing and The image after dynamic range compression; the first shot image group may include: a first normal exposure image and a first abnormal exposure image;

[0071] Step 202: Determine the first brightness difference information between the first standard dynamic range image and the first abnormally exposed image according to the prediction model; the training data of the prediction model may include: abnormally exposed image samples, and a sample of the abnormally exposed images. The target image s...

Embodiment 2

[0130] refer to Image 6 , showing a schematic flowchart of the steps of an exposure control method according to an embodiment of the present application, and the method may specifically include the following steps:

[0131] Step 601: Determine a first captured image group and a first standard dynamic range image corresponding to the first exposure parameter; wherein, the first standard dynamic range image may include: sequentially performing high dynamic image synthesis processing and The image after dynamic range compression; the first shot image group may include: a first normal exposure image and a first abnormal exposure image;

[0132] Step 602: Determine the first brightness difference information between the first standard dynamic range image and the first abnormally exposed image according to the prediction model; the training data of the prediction model may include: abnormally exposed image samples, and a pair of abnormally exposed images. The target image sample a...

Embodiment 3

[0147] refer to Figure 7 , showing a schematic flowchart of the steps of a shooting processing method according to an embodiment of the present application, and the method may specifically include the following steps:

[0148] Step 701: Perform image acquisition according to the second exposure parameter to obtain a second group of captured images; the second group of captured images may include: a second normal exposure image and a second abnormal exposure image;

[0149] Step 702: Perform a high dynamic image synthesis process on the second captured image group to obtain a second high dynamic range image;

[0150] Step 703: Perform dynamic range compression on the second high dynamic range image to obtain a second standard dynamic range image;

[0151] Step 704, performing preset processing on the second standard dynamic range image to obtain a target image;

[0152] Step 705, outputting the target image;

[0153] The process of determining the second exposure parameter ...

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Abstract

The embodiment of the invention provides an exposure control method, a shooting processing method, a shooting processing device and a medium. The exposure control method specifically comprises the following steps: determining a first shooting image group and a first standard dynamic range image corresponding to a first exposure parameter; wherein the first standard dynamic range image comprises an image obtained after high-dynamic image synthesis processing and dynamic range compression are sequentially carried out on the first shot image group; determining first brightness difference information between the first standard dynamic range image and the first abnormal exposure image according to a prediction model; determining first exposure adjustment information according to the first brightness difference information and the second brightness difference information; the second brightness difference information is determined according to target brightness information corresponding to the first exposure parameter and brightness information corresponding to the first abnormal exposure image; and adjusting the first exposure parameter according to the first exposure adjustment information to obtain a second exposure parameter. According to the embodiment of the invention, the image shooting quality can be improved.

Description

technical field [0001] The present application relates to the technical field of image processing, and in particular, to an exposure control method, a photographing processing method, a device and a medium. Background technique [0002] Exposure is the process of receiving light from the lens to form an image through the photosensitive device. During the shooting process, the light and dark intensity of the shooting background or the subject will change. When the outside light becomes stronger, it is easy to be overexposed, resulting in an image that is too bright and lacks layers and details. Exposure control is required during shooting. [0003] In the current exposure control method, the photometric technology is usually used to perform statistics on the ambient brightness of the captured image, and to determine the exposure parameters matching the statistical results of the ambient brightness. [0004] In practical applications, the brightness of the captured image is ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H04N5/235H04N5/265H04N5/355
CPCH04N5/265H04N23/70H04N23/73H04N25/57
Inventor 卢东东张乐杨作兴
Owner SHENZHEN MICROBT ELECTRONICS TECH CO LTD
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