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Grey mask and method for making same

A technology of gray-tone mask and manufacturing method, which is applied in semiconductor/solid-state device manufacturing, photolithographic process of patterned surface, optics, etc., and can solve problems such as difficulty in precise control of film thickness, large aspect ratio, and practical difficulties

Inactive Publication Date: 2006-11-29
HOYA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in this method, since the film thickness is too thick, the aspect ratio (the ratio of the pattern size to the height) is large. As a result, the pattern shape and pattern accuracy of the light-shielding part are poor, and the etching time is long.
In addition, in fact, it is difficult to accurately control the film thickness by half etching, and it is difficult to use it practically.

Method used

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  • Grey mask and method for making same
  • Grey mask and method for making same
  • Grey mask and method for making same

Examples

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Embodiment Construction

[0081] Next, a first embodiment of the present invention will be described.

[0082] Synthetic data when all graphic data including the shading part, light-transmitting part and gray tone part are included, such as figure 1 As shown in (1), the case where the light-shielding part 1 and the light-transmitting part 2 (such as an amorphous silicon pattern of TFT) and the gray tone part 3 (semi-transmitting part and semi-transmitting part) formed around them is taken as an example. In this situation, figure 1 The data of the light shielding part 1 and the light transmitting part 2 shown in (2) and figure 1 Data separation of the gray tone section 3 shown in (3). Then, after drawing the light-transmitting portion with an exposure amount (100%) that can completely remove the resist, the gray tone portion 3 (semi-transmission portion or semi-transmission portion Translucent part), can be figure 1 (1) A depiction of the graph shown. in the case of figure 1 The drawing patte...

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Abstract

The present invention provides one kind of grey mask capable of making transmissivity controllable and homogeneous film thickness and its making process. For example, on the transparent substrate, transmissivity controllable film, low transmissivity film and photoresist film are formed successively; the photoresist film and the low transmissivity film in some part are eliminated to form transparent part; and the photoresist film and partial low transmissivity film in some other part are eliminated to form grey part and to make grey mask.

Description

technical field [0001] The present invention relates to a gray tone mask, its manufacturing method and the like. Background technique [0002] In recent years, in the field of masks for large LCDs, attempts have been made to reduce the number of masks using grayscale masks (Monthly FPD Intelligence, May 1999). [0003] Here, a grayscale mask, for example, such as Figure 5 As shown in (1), it has a light-shielding part 1 , a light-transmitting part 2 and a gray tone part 3 . The gray-tone part 3 is an area where a fine light-shielding pattern 3a is formed within the resolution limit of a large-scale LCD exposure machine using a gray-tone mask. The purpose of its formation is to reduce the amount of light transmitted through this area and reduce The thickness of the photoresist film can optionally be changed according to the amount of irradiation. Both the light-shielding portion 1 and the fine light-shielding pattern 3a are generally formed of films of the same thickness m...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/14G03F7/26G03F1/32
Inventor 野津手重德
Owner HOYA CORP
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