Grey mask and method for making it

A technology of gray-tone mask and manufacturing method, which is applied in the direction of semiconductor/solid-state device manufacturing, photolithographic process exposure device, patterned surface photolithographic process, etc. Long time and other issues

Inactive Publication Date: 2007-04-04
HOYA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in this method, since the film thickness is too thick, the aspect ratio (the ratio of the pattern size to the height) is large. As a result, the pattern shape and pattern accuracy of the light-shielding part are poor, and the etching time is long.
In addition, in fact, it is difficult to accurately control the film thickness by half etching, and it is difficult to use it practically.

Method used

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  • Grey mask and method for making it
  • Grey mask and method for making it
  • Grey mask and method for making it

Examples

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Embodiment Construction

[0083] Next, a first embodiment of the present invention will be described.

[0084]As shown in Figure 1(1), the composite data includes all the graphics data of the light-shielding part, the light-transmitting part and the gray-tone part, from the light-shielding part 1 and the light-transmitting part 2 (for example, the amorphous silicon pattern of TFT) and its surroundings The case where the gray tone portion 3 (semi-transmissive portion and semi-transmissive portion) is formed is an example. In this case, the data of the light-shielding part 1 and the light-transmitting part 2 shown in FIG. 1(2) are separated from the data of the gray tone part 3 shown in FIG. 1(3). Then, after drawing the light-transmitting portion with an exposure amount (100%) that can completely remove the resist, the gray tone portion 3 (semi-transmission portion or semi-transmission portion Light-transmitting part) can draw the graph shown in Fig. 1(1). With the drawing pattern shown in FIG. 1(1), ...

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Abstract

A method for preparing half-tone mask includes forming transmitivity control film and transmitivity reduced film as well as resist film in sequence on transparent substrate, removing off resist film and transmitivity reduced film as well as transmitivity control film on position being used to from light transmission unit for forming light transmission unit then removing off resist film and transmitivity reduced film on position being used to form half-tone unit for forming half-tone unit so as to achieve purpose of preparing half-tone mask.

Description

[0001] This application is a divisional application of a Chinese invention patent application with an application date of June 18, 2002, an application number of 02123331.4, and an invention title of "gray tone mask and its manufacturing method". technical field [0002] The present invention relates to a gray tone mask, its manufacturing method and the like. Background technique [0003] In recent years, in the field of masks for large LCDs, attempts have been made to reduce the number of masks using grayscale masks (Monthly FPD Intelligence, May 1999). [0004] Here, the gray tone mask includes, for example, a light shielding portion 1 , a light transmitting portion 2 and a gray tone portion 3 as shown in FIG. 5( 1 ). The gray-tone part 3 is an area where a fine light-shielding pattern 3a is formed within the resolution limit of a large-scale LCD exposure machine using a gray-tone mask. The purpose of its formation is to reduce the amount of light transmitted through this ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/14G03F7/09G03F7/20G03F7/26H02M7/48
CPCH02M7/53873H02M2001/0012H02M2007/53876H02M1/0012H02M7/53876
Inventor 野津手重德
Owner HOYA CORP
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