Placode treating method and treater

Abstract

Provided is a method in which the consumption of a rinsing liquid (pure water) can be reducible when a substrate is processed by supplying the rinsing liquid to the surface of the substrate. In the beginning when the substrate W has been carried in a processing chamber 12 of a washing process part 10, the rinsing liquid is supplied from an entrance nozzle 20 and an upper spray nozzle 22 to the substrate, and after that, the rinsing liquid is supplied from the upper spray nozzle 22 and a lower spray nozzle 24 to the substrate until the substrate is carried out of the processing chamber 12.

Description

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AI Technical Summary

Benefits of technology

This patented technology describes an improved process for cleaning semiconductor wafers during manufacturing processes such as chemical mechanical polishing ("CMP"), electroplating, etchback treatment, etc., which involves treating them with different types of liquids at specific times while minimizing waste by recirculation of spent rinse fluids containing impurities like ammonia. By doing this, more efficient use of purified solvents reduces costs compared to traditional methods involving multiple steps. Additionally, the reuse of used rinser liquid helps prevent corrosion caused by excess acidic materials present on surfaces being processed. Overall, these improvements improve overall performance and efficiency of wafer production.

Problems solved by technology

Technological Problem: Current Liquid Dry Plasma Display Sheet Process Apparatus described in UV Disclosure describes a method called wet removal process for removing residue left over after coating metal sheets during manufacturing processes like lithography. However, current methods have issues related to use of purified water due to incomplete separation between different chemical solutions present within each step. Additionally, existing systems require separate supplies of purewater throughout the entire system leading to increased costs associated with waste disposal operations.

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