Semiconductor light-emitting device and its manufacturing method
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- PANASONIC CORP
- Publication Date
- 2005-03-30
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The present invention relates to a surface emission type semiconductor light emitting element using a photonic crystal grown on a substrate and a manufacturing method thereof. Background technique
[0002] Conventional semiconductor light-emitting elements using photonic crystals are disclosed, for example, in (Japanese) Unexamined Patent Publication No. 11-330619, Japanese Unexamined Publication No. 2001-308457, and Japanese Unexamined Publication No. 2001-9800 (US Patent Publication No. 2002 / 0109134 No. Specification), JP-A-63-205984 (US Patent No. 4847844 Specification), JP-A-2002-062554, etc.
[0003] In addition, similarly, it is also disclosed in 'Imada: Appl. Phys. Lett. 75 (1999) 316'. figure 1 It is a perspective view showing the structure of a conventional semiconductor light-emitting element using the photonic crystal disclosed in this "Imada". like figure 1 As shown, on an n-type InP substrate 51, an n-type InP photonic crystal layer 52,...