Pattern replication with intermediate stamp

A cyclic olefin copolymer, copolymer technology, applied in the process of processing and utilizing such a polymer stamp, a two-step process of making and using such a polymer stamp, the field of polymer stamps for imprinting processes, It can solve the problems of non-reusable, reducing the fidelity of replicas, difficult template release, etc.

Active Publication Date: 2007-02-21
OBDUCAT AB SE
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Rigid stamp or substrate materials are often used, which will cause air impurities between the stamp and the plastic layer when the stamp is pressed against the substrate, also reducing the fidelity of the reproduction
Moreover, particulate impurities between the stamp and the plastic layer can cause significant damage to the stamp or substrate during the imprinting process, especially when neither the stamp nor the substrate are composed of flexible materials
Physical damage to the stamp or the substrate or both can also occur when the rigid stamp is released from the rigid substrate, making it difficult to release the substrate and templates including patterns with high aspect ratios after the imprint process
Impressions once damaged are usually not reusable

Method used

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  • Pattern replication with intermediate stamp
  • Pattern replication with intermediate stamp
  • Pattern replication with intermediate stamp

Examples

Experimental program
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Effect test

Embodiment 1

[0122] A nickel template with a line pattern with a line width of 80 nm and a height of 90 nm on the surface was imprinted into Zeonor ZF14 at 150° C. and 50 bar for 3 minutes. The Ni surface is pretreated with a fluorinated SAM anti-stick layer to obtain a low surface tension below 20 mN / m, preferably below 18 mN / m. The Zeonor foil is mechanically removed from the stencil surface without damaging the pattern of the stencil nor the pattern of the replica. Zeonor foil was used as a new template, which was imprinted into a 100 nm-thick SU8 film. The SU8 film was spin-coated onto a 20 nm LOR film previously spin-coated onto a silicon substrate, and neither surface was treated with an additional coating in order to improve the anti-stick properties between the SU8 film and Zeonor foil. Imprinting was carried out at 70° C. and 50 bar for 3 minutes. The SU8 film was exposed to UV light for 4 seconds through an optically clear Zeonor foil and baked for over 2 minutes. During the e...

Embodiment 2

[0124] Using the same method and the same parameters as already described in Example 1, a nickel template (developed by AFM) with a BluRay pattern with a structure height of 100 nm and a width of 150 nm on the surface was imprinted into Zeonor ZF14. Zeonor foil was used as a new template, which was imprinted into a 100 nm-thick SU8 film. Again, the same method and the same parameters as already described in Example 1 are used here. AFM images of imprints obtained in SU8 thin films deposited on silicon wafers in image 3 shown in.

Embodiment 3

[0126] A nickel template with a surface comprising high aspect ratio micron patterns ranging from 1-28 was used. Feature sizes range from 600nm-12μm with a height of 17μm. Before embossing, the surface is covered with a phosphate-based anti-stick film. Nickel templates were imprinted into polycarbonate foil at 190°C and 50 bar for 3 minutes. To improve the anti-stick properties between the Ni template and the polycarbonate film, the surface of the polycarbonate foil was treated with an additional coating. The release temperature was 130°C at which the polycarbonate foil could be mechanically removed from the nickel surface without damaging the pattern of the template nor the pattern of the replica. Polycarbonate foil was used as a new template to imprint the Topes foil. Imprinting was carried out at a temperature of 120° C. and a pressure of 50 bar for 3 minutes. None of the surfaces were treated with an additional coating to improve the anti-stick properties between the p...

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Abstract

A method for transferring a pattern from a template (1) to an object (12) using a two-step process in the imprinting process. The first step involves contacting the pattern of the template surface with a polymer material comprising one or more cyclic olefin copolymers (COCs) to produce a flexible polymer replica with a structured surface patterned inversely to the template surface. In a second step, after releasing the flexible polymer replica from the template, the reverse pattern of the flexible polymer replica is pressed into the resist layer on the substrate to imprint therein a replica of the template surface pattern.

Description

technical field [0001] The present invention relates to the field of imprint lithography, which includes the process of transferring a pattern from a template or stamp to a substrate by contacting the structured surface of the template or stamp with a plastic layer on a target surface of the substrate. More specifically, the present invention relates to polymeric stamps for imprinting processes having material properties that make the polymeric stamps suitable for such processes. The present invention also relates to a two-step process for making and using such polymeric stamps. In this two-step process, a replica of the template pattern is formed on a flexible polymer foil by embossing or injection molding to obtain an intermediate polymer stamp, which is then used in the second step to A pattern is imprinted on the plastic layer applied to the target surface of the substrate. In particular, the present invention relates to polymeric stamps made from materials comprising on...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00
CPCG03F7/0002B82Y10/00B82Y40/00
Inventor 巴贝克·海达里马克·贝克马赛厄斯·基尔
Owner OBDUCAT AB SE
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