Pattern replication with intermediate stamp
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- OBDUCAT AB SE
- Publication Date
- 2007-02-21
Smart Images
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Abstract
Description
technical field
[0001] The present invention relates to the field of imprint lithography, which includes the process of transferring a pattern from a template or stamp to a substrate by contacting the structured surface of the template or stamp with a plastic layer on a target surface of the substrate. More specifically, the present invention relates to polymeric stamps for imprinting processes having material properties that make the polymeric stamps suitable for such processes. The present invention also relates to a two-step process for making and using such polymeric stamps. In this two-step process, a replica of the template pattern is formed on a flexible polymer foil by embossing or injection molding to obtain an intermediate polymer stamp, which is then used in the second step to A pattern is imprinted on the plastic layer applied to the target surface of the substrate. In particular, the present invention relates to polymeric stamps made from materials comprising on...