Method of making fine-pitch circuit lines
a technology of fine-pitch circuit lines and circuit lines, which is applied in the direction of cable/conductor manufacturing, superimposed coating process, coating, etc., can solve the problems of mushroom defect and inability to realize fine-pitch circuit layout, and achieve the effect of high etching factor
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[0026]Referring to FIGS. 2-5, the method of making fine-pitch circuit lines according to a first preferred embodiment of the present invention is carried out as follows. First, an insulative substrate 10 made of polyimide is provided. Thereafter, on the insulative substrate 10 a copper conductive layer 20 having a thickness of about 7.97 μm is disposed. And then, a hetero layer 30 having a thickness of about 0.792 μm is disposed on the top surface of the conductive layer 20 by electroplating, chemical vapor deposition or sputtering. It is to be noted that the term “hetero layer” defined in the present invention means that the layer is made of a material different from the material that the conductive layer is made of. In this embodiment, the hetero layer 30 can be made of, but not limited to, nickel (Ni) or tin (Sn). On the other hand, the copper conductive layer 20 and the hetero layer 30 can be pre-formed into a laminate which can be directly disposed on the insulative substrate 1...
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