Method of making fine-pitch circuit lines

a technology of fine-pitch circuit lines and circuit lines, which is applied in the direction of cable/conductor manufacturing, superimposed coating process, coating, etc., can solve the problems of mushroom defect and inability to realize fine-pitch circuit layout, and achieve the effect of high etching factor

Inactive Publication Date: 2011-08-25
SUBTRON TECH
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0008]As discussed above, it is desired to provide a method that can exactly form fine-pitch circuit lines for a PCB. Therefore, it is an objective of the present invention to provide a method of making fine-pitch circuit lines exhibiting a high etching factor on a PCB substrate or a substrate for a chip package.
[0010]Still another objective of the present invention is to provide a method of making fine-pitch circuit lines, which can reduce the etching time.

Problems solved by technology

Specifically speaking, if the conductive layer is a copper layer and the etchant is FeCl3 for example, the etchant will also attack the sidewalls of the copper conductive layer that are not protected by the photoresist in addition to the desired vertical etching, causing a mushroom defect.
In addition, the fine-pitch circuit layout can not be realized due to the sectional area of the circuit line is not in a rectangular shape completely.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method of making fine-pitch circuit lines
  • Method of making fine-pitch circuit lines
  • Method of making fine-pitch circuit lines

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0026]Referring to FIGS. 2-5, the method of making fine-pitch circuit lines according to a first preferred embodiment of the present invention is carried out as follows. First, an insulative substrate 10 made of polyimide is provided. Thereafter, on the insulative substrate 10 a copper conductive layer 20 having a thickness of about 7.97 μm is disposed. And then, a hetero layer 30 having a thickness of about 0.792 μm is disposed on the top surface of the conductive layer 20 by electroplating, chemical vapor deposition or sputtering. It is to be noted that the term “hetero layer” defined in the present invention means that the layer is made of a material different from the material that the conductive layer is made of. In this embodiment, the hetero layer 30 can be made of, but not limited to, nickel (Ni) or tin (Sn). On the other hand, the copper conductive layer 20 and the hetero layer 30 can be pre-formed into a laminate which can be directly disposed on the insulative substrate 1...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

A method of making fine-pitch circuit lines includes steps of preparing an insulative substrate, disposing a conductive metal layer on the insulative substrate, disposing on a whole or a part of a top surface of the conductive metal layer a hetero layer having an etching rate smaller than that of the conductive metal layer, forming a patterned mask of circuit lines on the hetero layer, wet etching the hetero layer and the conductive metal layer, and removing the patterned mask and the hetero layer so as to form fin-pitch circuit lines having a high etching factor on the insulative substrate.

Description

BACKGROUND OF THE INVENTION[0001]1. Field of the Invention[0002]The present invention relates generally to a method of making a printed circuit board (hereinafter referred to as “PCB”), and more specifically to a method of making a PCB having fine-pitch circuit lines thereon.[0003]2. Description of the Related Art[0004]Conventionally, integrated circuit chips or electronic components are mechanically supported by and electrically connected with a PCB or a wiring substrate for a chip package. For electrical connection with the chips or the electronic components, the circuit board or the substrate is provided at the top thereof with circuit lines forming a specific circuit pattern. It is well known that the circuit pattern is mainly made by wet etching. In the known conventional etching methods, the wet etching, which is developed and adopted by manufacturers long time ago, is nowadays still being used extensively because of its economic advantage. Basically, the production of circuit...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & AuthorityApplications(United States)
IPC IPC(8): C23F1/02C25D5/00
CPCC23F1/02H05K3/06C23F1/44C23F1/14
InventorWU, CHIEN-NANHUANG, GUAN-WEI
OwnerSUBTRON TECH