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Method for producings uper-resolution micro structure diffraction optical element

A technique for diffractive elements and manufacturing methods, applied to optical elements, diffraction gratings, optics, etc., can solve problems such as difficulty in realization, contamination of recording media, and difficulty in operation, and achieve simple and easy process, low surface roughness, and safety Good results

Inactive Publication Date: 2007-10-24
ZHEJIANG UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This technology is difficult to realize; and it pollutes the recording medium; in addition, the system has very small tolerances for the disc's jump, skew and optical pickup drift, and the operation is difficult

Method used

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  • Method for producings uper-resolution micro structure diffraction optical element
  • Method for producings uper-resolution micro structure diffraction optical element

Examples

Experimental program
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Effect test

Embodiment 1

[0018] With reference to Fig. 1, 2, a kind of fabrication method of super-resolution microstructure diffraction element comprises the following steps: (1) prepare the photolithography mask plate with super-resolution diffraction figure with conventional ultraviolet lithography mask plate making technology, described photolithography The engraving mask is a chrome plate, and the working area of ​​the mask is a circle, and the circle is closely surrounded by a central circle, an intermediate ring and a peripheral ring in sequence, the outer diameter of the peripheral ring is 1.0 cm, and the inner diameter of the intermediate ring is 1.0 cm. and outer diameters of 0.04 cm and 0.95 cm; (2) Coating a layer of 103-B UV negative photoresist on the UV-transmitting quartz glass through routine cleaning, and curing with a hot plate, the baking temperature is 75 DEG C, and the baking time is 20 minutes; (3) carry out photoetching to photoresist with ultraviolet lithography method, the pho...

Embodiment 2

[0020] A method for making a super-resolution microstructure diffraction element, comprising the following steps: (1) preparing a photolithography mask with a super-resolution diffraction pattern using a conventional ultraviolet lithography mask manufacturing technique, the photolithography mask being a chrome plate , the working area of ​​the reticle is a circle, and the circle is closely surrounded by a central circle, an intermediate ring and a peripheral ring in sequence, the outer diameter of the peripheral ring is 1.0 cm, and the inner and outer diameters of the middle ring are 0.04 cm and 0.95 cm; (2) Coating a layer of 103-B UV negative photoresist on the UV-transparent quartz glass through conventional cleaning treatment, and baking and curing with a hot plate, the baking temperature is 85 ° C, and the baking temperature is 85 ° C. The time is 15 minutes; (3) carry out photoetching to photoresist with ultraviolet lithography method, the photoetching mask plate that ado...

Embodiment 3

[0022] A method for making a super-resolution microstructure diffraction element, comprising the following steps: (1) preparing a photolithography mask with a super-resolution diffraction pattern using a conventional ultraviolet lithography mask manufacturing technique, the photolithography mask being a chrome plate , the working area of ​​the reticle is a circle, and the circle is tightly surrounded by a central circle, an intermediate ring and a peripheral ring in sequence, the outer diameter of the peripheral ring is 1.0 cm, and the inner and outer diameters of the intermediate ring are 0.04 cm and 0.95 cm; (2) Coat a layer of 103-B UV negative photoresist on the UV-transmitting quartz glass that has been conventionally cleaned, and bake and cure with a hot plate, and the baking temperature is 80°C. Baking time It was 18 minutes; (3) carry out photoetching to photoresist with ultraviolet lithography method, the photoetching mask plate that adopts is the chrome plate that ste...

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Abstract

The preparing method includes steps: (1) preparing circular photo-etching mask including central circle, intermediate ring and peripheral ring enclosed closely; (2) coating a layer of negative photoresist on a material being transparent to ultraviolet light, baking and solidifying then by using heat plate; (3) photo etching the photoresist; (4) baking and developing the etched sample; (5) developing a layer of metal film on the said sample through sputtering or evaporating method; (6) dipping the developed sample in acetone solution in order to remove residual photoresist. Thus, including base seat (in use for fixing the element to outside), peripheral bright ring, middle dark ring and bright central circle, reserved structure is the said diffraction optical element in microstructure with super resolution.

Description

(1) Technical field [0001] The invention relates to a manufacturing method of a microstructure diffractive optical device, which is suitable for making a super-resolution diffractive optical device in order to increase the information storage density of an existing optical head device. (2) Background technology [0002] High-density information storage has always been a hot research topic in the field of information at home and abroad. Increasing the numerical aperture of the objective lens of the optical pickup and shortening the wavelength of the recording light source can reduce the size of the recording spot. For an optical disc with the same size and the same recording medium, a reduction in the size of the recording spot means an increase in the storage density of the optical disc. Therefore, many researchers have been devoting themselves to the development of shorter-wavelength semiconductor lasers as light sources for optical disc storage systems, as well as researc...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/18G02B13/00
Inventor 乐孜纯董文
Owner ZHEJIANG UNIV OF TECH
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