Single-line arrangement development processing apparatus

Abstract

To prevent the prolongation of a transfer line and the generation of uneven development in an inline type developing equipment wherein supply and recovery steps of a developer to / from a substrate such as a glass substrate or the like and a rinsing step are continuously performed. In a substrate W wherein an exposed resist film is formed on its surface, a developer is supplied onto the surface of the substrate W in a developer supply part 2, and a developing reaction is progressed while it is conveyed, and then the developer is recovered in a developer recovery part 4, the substrate is cleaned and a cleaning liquid is recovered in a rinsing liquid supply / recovery part 6, and finally the substrate is fed to a drying part 8. In such a sequential developing process, when there is any substrate in a processing part on the downstream side, in a waiting part just before the processing part, e.g. in a waiting part 3 in case when the processing part is the developer recovery part 4, a roller is repeatedly turned in normal and reverse directions, thereby reciprocating the substrate as shown in a diagram 2. As a result, an area on the rear surface of the substrate W that is in contact with the roller 10a is always shifted without stopping at one place, so that the distribution of temperature becomes uniform on the substrate.

Description

technical field [0001] The present invention relates to an in-line developing treatment device and method for continuously performing processes such as supplying developing solution, recovering developing solution, and rinsing a substrate such as a glass substrate. Background technique [0002] When forming a resist film of a predetermined pattern on a glass substrate such as a liquid crystal substrate, the resist film formed on the surface of the glass substrate is exposed to a predetermined pattern, and only the predetermined pattern is left (or removed) by development. resist film. [0003] When performing the above-mentioned development treatment, firstly, a developer is supplied and applied to the exposed resist film surface, and a development reaction is carried out within a predetermined time period. After the reaction is completed, the developer is collected or discarded, and then dried after a rinsing process. Furthermore, an in-line developing method in which the ...

AI Technical Summary

Problems solved by technology

[0011] Furthermore, in the method provided by Patent Document 2, a new problem arises that particles are rolled up and attached to the substrate surface

In particular, with the current increase in the size of glass substrates, the occurrence of unevenness has become a major problem

[0012] Conversely, even when the temperature of the roller is the same as that of the surrounding air, the problem of uneven development occurs due to the difference in heat transfer coefficient between the air and the roller.

[0013] In addition, if the substrate is not stopped, the problem caused by the roller contacting the specific position of the substrate for a predetermined time can be eliminated, but the transportation line of this part must be increased, so the scale of the device is large

Images