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Base plate processing device

A substrate processing device, substrate technology, applied in the direction of transportation and packaging, conveyor objects, optics, etc., to achieve the effect of reducing the difference in the degree of progress, efficient recycling, and eliminating uneven processing

Inactive Publication Date: 2009-04-29
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this way, when the liquid layer of the developer solution is formed, the timing of starting the development reaction is not related to the difference between the front side and the rear side of the substrate, and the timing of the development reaction slowing down or stopping is approximately simultaneous on the entire surface of the substrate, causing the substrate surface to become thinner. The development reaction on the front side of the substrate proceeds earlier than the development reaction on the rear side, and it is impossible to perform uniform development treatment on the surface of the substrate.

Method used

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  • Base plate processing device
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Embodiment Construction

[0048] Hereinafter, a substrate processing apparatus according to an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a side view schematically showing the overall configuration of a substrate processing apparatus according to a first embodiment of the present invention. figure 2 It is a diagram showing the state of liquid blocking by the liquid blocking blade 45 . In this substrate processing apparatus 1 , for example, a developer is supplied as a processing liquid to the surface of a rectangular glass substrate for LCD (hereinafter simply referred to as a substrate) S to perform development processing, and then a cleaning liquid is supplied to perform cleaning processing.

[0049] The substrate processing apparatus 1 includes: a liquid layer forming chamber 2 for supplying a developing solution to the surface of a substrate S conveyed in a horizontal posture, and forming a liquid layer of the developing solution on the surface o...

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Abstract

A substrate processing unit converting the substrate to a gradient gesture after forming a liquid layer of treating liquid on the surface of substrate in horizontality, can uniformly treat the surface of substrate with treating liquid. When the substrate in which the developer is supplied to the surface by the developer supplying nozzle is moved to a tilt mechanism by a moving roller, the developer supplying nozzle supplies the developer to the top end of the substrate beginning change to the gradient gesture by the tilt mechanism. The substrate in changed gesture is moved to a scrubbing compartment of next step by the moving roller.

Description

technical field [0001] The present invention relates to a substrate processing device, in particular to a technology for supplying processing liquid to the surface of a substrate. Background technique [0002] Conventionally, a substrate processing apparatus is known that supplies a processing liquid such as a developer to the substrate surface in order to develop the exposed substrate surface. For example, Patent Document 1 proposes a substrate processing apparatus in which a substrate is conveyed in a horizontal state in a predetermined direction, and at the same time, a liquid layer of a developer is formed on the surface of the substrate. For processing, after further placing the substrate in an inclined state, the inclined state substrate is cleaned. [0003] Patent Document 1: JP Unexamined Patent Publication No. H-87210. [0004] According to the existing substrate processing apparatus, after supplying the developing solution, the substrate is placed in an inclined ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/00H01L21/027H01L21/677G03F7/00G03F7/30
CPCH01L21/0274H01L21/68714
Inventor 芳谷光明
Owner DAINIPPON SCREEN MTG CO LTD