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Lithographic apparatus and device manufacturing method

A lithographic projection and component technology, which is applied in semiconductor/solid-state device manufacturing, photolithography exposure equipment, microlithography exposure equipment, etc., can solve unpredictable problems

Active Publication Date: 2009-08-12
ASML NETHERLANDS BV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This requires additional or more powerful electric motors, turbulence in the liquid may cause undesirable and unpredictable effects

Method used

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  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0035] figure 1 A lithographic apparatus according to an embodiment of the present invention is schematically shown. The unit includes:

[0036] - an illumination system (illuminator) IL configured to adjust a radiation beam PB (eg UV radiation or DUV radiation);

[0037] - a support structure (e.g. a mask table) MT configured to support a patterning device (e.g. a mask) MA, connected to a first positioning device PM configured to precisely position the patterning device according to certain parameters;

[0038] - a substrate table (e.g. wafer table) WT configured to hold a substrate (e.g. a resist-coated wafer) W connected to a second positioner PW configured to precisely position the substrate according to certain parameters ;and

[0039] - A projection system (eg a refractive projection lens system) PL configured to project the pattern applied to the projection beam PB by the patterning device MA onto a target portion C of the substrate W (eg comprising one or more dies...

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PUM

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Abstract

A lithographic projection apparatus configured to use a projection system to project a pattern from a patterning apparatus onto a substrate, having a liquid supply system configured to supply liquid into a space between the projection system and the substrate , further comprising a liquid removal system, the liquid removal system comprising: a conduit having an open end adjacent a volume in which liquid is present; a porous member located between an end of the conduit and the volume; configured to be operable therein a suction device for creating a pressure difference on the porous member; and a member at least partially surrounding the space, the conduit including a recess in a surface of the member facing the substrate, the porous member closing the Recesses, the porous member having pores with diameters in the range of 5 to 50 microns. The invention also provides a device manufacturing method.

Description

technical field [0001] The invention relates to a lithographic apparatus, and a method for manufacturing a device. Background technique [0002] A lithographic apparatus is a machine that can apply a desired pattern on a substrate, usually a target portion of the substrate. A lithographic apparatus may be used, for example, in the manufacture of integrated circuits (ICs). In this case, a patterning device, also known as a mask or reticle, may be employed to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred to a target portion (eg, comprising one or more dies) on a substrate (eg, a silicon wafer). Transfer of the pattern is usually accomplished by means of imaging onto a layer of radiation-sensitive material (resist) provided on the substrate. Typically, a single substrate contains a network of adjacent target portions that are successively patterned. Known lithographic apparatuses include so-called steppers, in w...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20H01L21/027
CPCG03F7/70341G03F7/70866G03F7/7095G03F7/708H01L21/0274G03F7/2041G03F7/70858G03F7/70883
Inventor N·R·肯佩H·H·M·科西S·N·L·多德斯R·F·德格拉附C·A·胡根达姆N·坦卡特J·J·S·M·梅坦斯F·范德穆伦F·J·H·M·特尤尼斯森J·-G·C·范德图尔恩M·C·M·维哈根S·P·C·贝弗罗恩德J·P·M·斯穆勒斯H·弗戈
Owner ASML NETHERLANDS BV