Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Inverse fuse wire and memory cell without ability to cause non-linear current after fusing

A non-linear current and storage unit technology, applied in the direction of electrical components, circuits, electric solid-state devices, etc., can solve the problems that the sensing circuit cannot correctly detect whether the storage unit is programmed, and the reliability of the one-time programming memory.

Inactive Publication Date: 2008-09-24
UNITED MICROELECTRONICS CORP
View PDF0 Cites 74 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The p / n junction will cause a non-linear current after the anti-fuse is blown, and the non-linear current will make the sensing circuit of the one-time programming memory unable to correctly detect whether the memory cell is programmed, which affects the reliability of the one-time programming memory Have a great impact

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Inverse fuse wire and memory cell without ability to cause non-linear current after fusing
  • Inverse fuse wire and memory cell without ability to cause non-linear current after fusing
  • Inverse fuse wire and memory cell without ability to cause non-linear current after fusing

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0033] Please refer to Figure 4 , Figure 4It is a cross-sectional view of the antifuse 30 according to the first embodiment of the present invention. The antifuse 30 includes an n-type substrate 31 , two p+ doped regions 32 , a p-type channel 37 , a dielectric layer 33 , a conductive layer 34 , an insulating layer 35 and a wire 36 . Two p+ doped regions 32 and a p-type channel 37 are implanted from above the n-type substrate 31 to form in the n-type substrate 31 . The dielectric layer 33 is silicon dioxide and formed on the n-type substrate 31 to isolate the n-type substrate 31 from the conductive layer 34 . The conductive layer 34 is polysilicon formed on the dielectric layer 33 . The insulating layer 35 is silicon dioxide and is used to isolate the conductive layer 34 and the wire 36 . The wire 36 is a metal wire, and is coupled to the two p+ doped regions 32 through the contact window. A first end of the antifuse 30 is a conductive layer 34 , a second end of the anti...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The anti-fuse is formed by a transistor of a channel with doping carriers, which can not lead to the nonlinear electric current after fusing and can be used for a memory cell of a memorizer for programming of expression of first degree. The memorizer for programming of expression of first degree adopts a P-shaped transistor and an N-shaped transistor for programming for the anti-fuse. As the anti-fuse is provided with the channel with doping carriers, after the anti-fuse is fused, the electric current can not flow through the P / N knob between two doping regions and basements to form a nonlinear electric current, thus leading the memory cell to be programmed correctly.

Description

technical field [0001] The invention relates to an antifuse, in particular to an antifuse which will not cause nonlinear current after fusing. Background technique [0002] Anti-fuse (anti-fuse) is a kind of component that is short-circuited at both ends after fusing relative to the fuse. Generally, the two ends of the antifuse are separated by a silicon oxide-like insulating layer. In the disconnected state, there is a high resistance value between the two ends of the antifuse, and the insulating layer is broken down by applying a high voltage. The two ends of the antifuse form a short circuit, which has a low resistance value of about 5-25K ohms, so the antifuse is very suitable for use in programming memories. The programming memory using the anti-fuse can provide better protection in terms of confidentiality due to its one-time programming (One-Time Programming, OTP) feature. At present, the commonly used antifuse is to use the structure of complementary metal oxide se...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L23/525H01L27/112H01L27/115H10B69/00
Inventor 张光晔许兴仁何仲仁
Owner UNITED MICROELECTRONICS CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products