Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Microorganism resistance test apparatus and method for verification of plasma sterilization

A plasma, test device technology, used in enzymology/microbiology devices, biochemical cleaning devices, biochemical equipment and methods, etc.

Inactive Publication Date: 2009-02-11
刘川生 +2
View PDF0 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since hydrogen peroxide plasma low-temperature sterilization technology is a new technology, at present, there

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Microorganism resistance test apparatus and method for verification of plasma sterilization
  • Microorganism resistance test apparatus and method for verification of plasma sterilization
  • Microorganism resistance test apparatus and method for verification of plasma sterilization

Examples

Experimental program
Comparison scheme
Effect test
No Example Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a microbial resistance test device and a method for plasma sterilization verification. The technical problem to be solved is to provide the microbial resistance test device and the method for the plasma sterilization verification, the invention aims at carrying out the research of the related sterilization resistance of standard microbial strains which are used after the hydrogen peroxide plasma sterilization test through the device and the method, thereby comparing and selecting the strain with the strongest resistance as the standard test strain. The technical proposal for solving the problems is as follows: a resistance detection device is arranged in an experimental tank room, a temperature sensor II is matched therewith, a neutralizer filling device and a sterilization media filling device are connected at the outside of the experimental tank room, the neutralizer filling device is communicated with the resistance detection device through a connecting guide tube I via a sealing interface on the wall of the experimental tank room, and the sterilization media filling device is connected with an atomizing nozzle which is arranged above the tank wall of a vacuum tank through a connecting guide tube II via a micro-electromagnetic valve. The microbial resistance test device and the method can be used for the hydrogen peroxide plasma sterilization test.

Description

technical field [0001] The invention relates to resistance test equipment, in particular to a microbial resistance test device and method for plasma sterilization verification. It is not only suitable for hydrogen peroxide plasma sterilization test, but also suitable for sterilization resistance test of microbial strains verified by various medical low-temperature gas sterilization methods. Background technique [0002] Hydrogen peroxide plasma low-temperature sterilization is the latest medical low-temperature sterilization technology in the world. Compared with other conventional medical sterilization technologies, it has the characteristics of low-temperature rapidity, energy saving, environmental protection, economical safety, etc. It can be used in hospital operating rooms, Clinical departments such as the supply room and speculum room conduct rapid low-temperature sterilization of various medical devices (including metal devices and non-metal devices). [0003] As a m...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C12M1/38C12M1/36C12M1/34
Inventor 刘川生
Owner 刘川生
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products