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Automatic layout method and device of photomask framework

An automatic layout and photomask technology, which is used in photomechanical processing of originals, optics, and patterned surfaces. It can solve the problems of complicated manual layout and waste of human resources, and avoid layout styles. Inconsistency, reducing complexity, saving human resources

Active Publication Date: 2011-04-13
FOUNDER MICROELECTRONICS INT
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  • Summary
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  • Description
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AI Technical Summary

Problems solved by technology

[0005] In order to solve the problem of wasting a lot of human resources due to the cumbersome and complicated manual layout method in the process of making Mask Frame in the prior art

Method used

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  • Automatic layout method and device of photomask framework
  • Automatic layout method and device of photomask framework
  • Automatic layout method and device of photomask framework

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Embodiment Construction

[0022] A method and device for automatic layout of a photomask frame provided by an embodiment of the present invention will be described in detail below with reference to the accompanying drawings.

[0023] like figure 1 As shown, an automatic layout method for a photomask frame provided by an embodiment of the present invention, in the process of implementing the embodiment of the present invention, the method includes:

[0024] 101: Obtain mask frame parameters and functional unit layout parameters;

[0025] 102: Generate a master chip array in the mask frame according to the mask frame parameters;

[0026] 103: Place the functional units in the mask frame according to the mask frame parameters and the functional unit layout parameters.

[0027] It should be noted that before step 101, it also includes:

[0028] Set the mask frame parameters; this parameter can be set and adjusted by the user according to the actual needs;

[0029] Create a functional cell layout parame...

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PUM

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Abstract

The invention discloses an autoplacement method and a device of a photomask frame, which belong to the technical field of semiconductor layout arrangement, and aim to solve the problem that a great deal of human resources caused by a fussy and complex manual arrangement manner are wasted during the facture process of the mask frame in the prior art. The provided autoplacement method of the photomask frame comprises the steps as follows: a photomask frame parameter and a functional unit layout parameter are obtained; a main chip array is generated in the photomask frame according to the photomask frame parameter; and a functional unit is put in the photomask frame according to the photomask frame parameter and the functional unit layout parameter. By adopting the autoplacement method and the device, the fussy degree of manual typesetting can be reduced greatly, a great deal of human resources can be saved, and the layout style of the photomask frame can also be kept accordant.

Description

technical field [0001] The invention relates to the technical field of semiconductor layout layout, in particular to an automatic layout technology of a mask frame. Background technique [0002] In the process of semiconductor manufacturing, the photolithography process is the most important circuit pattern transfer process. Among them, the mask Mask is an important material to realize the photolithography process, and can be used to engrave the circuit layout of the semiconductor chip. In the semiconductor foundry processing mode, the integrated circuit IC design company is responsible for designing the chip data, the semiconductor chip foundry Foundry is responsible for designing the Mask Frame data, and finally the mask company Mask Shop merges the chip data with the Mask Frame data to produce a Mask. In the Mask Frame data provided by Foundry, there are usually two types of data: photolithography unit Photo Cell and process control module unit PCM Cell. Among them, th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06F17/50G03F1/14G03F1/64
Inventor 郭斌马建霞
Owner FOUNDER MICROELECTRONICS INT
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