Automated dynamic cleaning device and method of tellurium-cadmium-mercury wafer solvent solution

A technology for cleaning devices and wafers, applied in liquid cleaning methods, chemical instruments and methods, cleaning methods and utensils, etc., can solve the problems of lack of stability and repeatability, limited number of shakes, chip fragmentation, etc., to achieve Effective consistency and repeatability, guaranteed reliability and repeatable effects

Active Publication Date: 2010-12-08
SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] For the solvent solution cleaning of mercury-tellurium-isolated wafers, the difficulty lies in that the ultrasonic vibration method is easy to break the wafer; the manual shaking method is not stable and repeatable because of the manu

Method used

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  • Automated dynamic cleaning device and method of tellurium-cadmium-mercury wafer solvent solution
  • Automated dynamic cleaning device and method of tellurium-cadmium-mercury wafer solvent solution
  • Automated dynamic cleaning device and method of tellurium-cadmium-mercury wafer solvent solution

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Embodiment Construction

[0025] The organic or inorganic cleaning solution 6 is poured into a quartz beaker 5, and the quartz beaker is placed in a constant temperature water tank 9 and a water bath 8. Put the mercury-tellurium barrier chip 18 upright in the polytetrafluoroethylene porous blue 19 and immerse it in the quartz beaker filled with solvent, connect the DC speed regulating power supply 14, start the DC motor 13 to drive the dial 10, and the lever 11 works in the chute 1. Circular movement, the slider moves up and down in the guide rail 15, and the porous PTFE basket moves up and down through the connection of the blue hand 17, arm lever 12, slider 4, chute 1 and other components to achieve dynamic cleaning. Purpose.

[0026] The automatic dynamic device for cleaning mercury-tellurium-barrier wafer solvent solution of the present invention has been successfully used in the development process of tellurium-mercury-barrier infrared detectors. image 3 .

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Abstract

The invention discloses automated dynamic cleaning device and method of a tellurium-cadmium-mercury wafer solvent solution. The automated dynamic cleaning device comprises a polytetrafluoroethylene porous turnbuckle, a quartz beaker, a constant temperature water tank, a handle, a force arm lever, a slide block, a guide rail, a parallel connecting rod, a driving lever, a driving plate, a sliding chute and a storage rack. The automated dynamic cleaning method is characterized in that an organic or inorganic solvent is infused into the quartz beaker; the quartz beaker is placed in a water bath of the constant temperature water tank; a tellurium-cadmium-mercury wafer is erected in the polytetrafluoroethylene porous turnbuckle, immersed into the quartz beaker infused with the organic or inorganic solvent connected with mechanisms such as the force arm lever, the slide block, the parallel connecting rod, and the like through the turnbuckle handle and provided with power through a DC motor so that the polytetrafluoroethylene porous turnbuckle moves up and down to achieve the purpose of dynamic cleaning.

Description

technical field [0001] The invention relates to a photoelectric device manufacturing process technology, in particular to an automatic dynamic cleaning device and method for a mercury tellurium barrier wafer solvent solution. Background technique [0002] There are many steps in the development process of mercury-tellurium-isolated infrared detectors. The process involves a series of processes such as surface treatment, dielectric film, photolithography, P-N junction, corrosion, metal electrodes, and interconnection. Solution cleaning process. Mercury tellurium barrier is a brittle semiconductor material, and the way of handling the wafer and cleaning it with solvent solution is extremely important. The traditional operation method is to use metal tweezers to pick it up in a solvent solution and clean it by ultrasonic vibration method or manual shaking method. [0003] With the development of mercury-tellurium-isolated infrared detectors, especially the surface treatment p...

Claims

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Application Information

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IPC IPC(8): B08B3/08
Inventor 朱建妹王正官
Owner SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
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