Liquid processing apparatus for substrate and liquid processing method
A liquid treatment and liquid treatment technology, which is applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve the problem that the temperature of the wafer is difficult to rise, and achieve the effect of inhibiting the adhesion of particles
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[0035] Hereinafter, embodiments of the present invention will be described with reference to the drawings. First, use Figure 7 A liquid processing system including the liquid processing device of the substrate according to the embodiment of the present invention will be described.
[0036] Such as Figure 7As shown, the liquid processing system includes: a mounting table 101, which is used to mount a carrier (carrier) that accommodates a substrate W (hereinafter also referred to as a wafer W) such as a semiconductor wafer as a substrate to be processed from the outside; 102, which is used to take out the wafer W contained in the bracket; the rack unit 103, which is used to load the wafer W taken out by the transport arm 102; the transport arm 104, which is used to receive the wafer W placed on the rack unit 103 The wafer W is transported into the liquid processing apparatus 1 . Such as Figure 7 As shown, multiple ( Figure 7 12 in the state shown) The liquid treatment a...
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