Thin film transistor liquid crystal display (TFT-LCD) array substrate and manufacturing method thereof

Abstract

The invention relates to a thin film transistor liquid crystal display (TFT-LCD) array substrate and a manufacturing method thereof. The manufacturing method comprises the following steps of: depositing a grid metal film, a grid insulation layer and a semiconductor film to form a figure comprising a grid line and a quasi semiconductor layer; depositing a passivation layer to form a semiconductor layer figure, a figure comprising a source electrode via hole and a drain electrode via hole on the semiconductor layer, and a doped semiconductor layer on the surface of the semiconductor layer in the source electrode via hole and the drain electrode via hole; and depositing a transparent conductive film and a source and drain metal film to form a figure comprising a pixel electrode, a data line,a source electrode and a drain electrode, wherein the source electrode is connected with the semiconductor layer through the doped semiconductor layer in the source electrode via hole and the drain electrode is connected with semiconductor layer through the doped semiconductor layer in the drain electrode via hole. The TFT-LCD array substrate can be manufactured through three times of processes, so the process is relatively simple, the process time can be shortened to the maximum extent, the production efficiency is improved, and the production cost is reduced.

Description

technical field [0001] The invention relates to a liquid crystal display and a manufacturing method thereof, in particular to a TFT-LCD array substrate and a manufacturing method thereof. Background technique [0002] At present, the manufacture of thin film transistor liquid crystal display (Thin Film Transistor Liquid Crystal Display, TFT-LCD for short) array substrate is completed by forming a pattern through a group of patterning processes. One patterning process forms a layer of patterning. The number of patterning processes can be measured to manufacture TFT-LCD. Due to the complexity of the array substrate, reducing the number of patterning processes means reducing the manufacturing cost. The five patterning processes in current technology include: gate line and gate electrode patterning, active layer patterning, source electrode / drain electrode patterning, passivation layer via hole patterning, and pixel electrode patterning. Each patterning process includes thin fil...

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Problems solved by technology

[0004] Since each patterning process needs to transfer the pattern of the mask plate to the film pattern, and each layer of film pattern needs to be accurately covered on another layer of film pattern, the five patterning processes in the prior art have complicated processes and production problems. Defects such as long cycle time and a large number of masks used, while a longer process cycle increases the incidence of defects, resulting in a decrease in yield and an increase in cost

However, in the four-step patterning process of the prior art, since the pattern of the TFT channel region is formed by partial exposure and multi-step etching process, the etching uniformity of the pattern of the TFT channel region is poor, and the performance of the thin film transistor is unstable.

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