Check patentability & draft patents in minutes with Patsnap Eureka AI!

Base manufacturing method

A manufacturing method and bottom frame technology, applied in nonlinear optics, instruments, optics, etc., can solve the problems of high complexity, inconvenience, and high base cost

Active Publication Date: 2011-05-11
E INK HLDG INC
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, in the prior art, the cost and complexity of manufacturing bases of different sizes are relatively high
[0004] It can be seen that the above-mentioned existing electrophoretic display panel base obviously still has inconvenience and defects in the manufacturing method and use, and needs to be further improved urgently.
In order to solve the above-mentioned problems, the relevant manufacturers have tried their best to find a solution, but no suitable design has been developed for a long time, and the general manufacturing method has no suitable method to solve the above-mentioned problems. This is obviously a problem. Issues that relevant industry players are eager to solve

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Base manufacturing method
  • Base manufacturing method
  • Base manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0032] In order to further explain the technical means and effects of the present invention to achieve the intended purpose of the invention, the specific implementation methods, methods, steps, features and effects of the manufacturing method of the base proposed according to the present invention will be described below in conjunction with the accompanying drawings and examples. , as detailed below.

[0033] The aforementioned and other technical contents, features and effects of the present invention will be clearly presented in the following detailed description of the embodiments with reference to the drawings. Through the description of the specific implementation mode, a more in-depth and specific understanding of the technical means and effects adopted by the present invention to achieve the intended purpose can be obtained. However, the accompanying drawings are only for reference and description, and are not used to explain the present invention. be restricted.

[0...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a base manufacturing method, which comprises the following steps of: firstly, providing a plate; secondly, processing the plate to form a bottom frame, wherein the bottom frame is provided with a bottom and a plurality of side walls arranged on the bottom, and the side walls and the bottom form a first accommodating space together; thirdly, judging whether the bottom frame is designed to be assembled with a first display panel or a second display panel, wherein the size of the first display panel is different from that of the second display panel; fourthly, if the bottom frame is designed to be assembled with the first display panel, forming a gasket on the bottom of the bottom frame to form a first base; and finally, if the bottom frame is designed to be assembled with the second display panel, stamping the bottom of the bottom frame to form a plurality of retaining walls and further form a second base, wherein the retaining walls and the bottom form a second accommodating space in the first accommodating space together. The base manufacturing method for selectively manufacturing different bases has low cost and low complexity.

Description

technical field [0001] The present invention relates to a method for manufacturing a carrying element, in particular to a method for manufacturing a base. Background technique [0002] figure 1 It is an exploded three-dimensional schematic diagram of a known electrophoretic display. see figure 1 , the conventional electrophoretic display (electrophoretic display) 100 includes an electrophoretic display panel (electrophoretic display panel) 110 , a base (base) 120 and a top frame (top frame) 130 . The upper frame 130 is assembled on the base 120 , and the electrophoretic display panel 110 is disposed between the upper frame 130 and the base 120 . The upper frame 130 exposes the display area 112 of the electrophoretic display panel 110 . [0003] However, the size of the electrophoretic display panel will vary according to the designer's requirements. For example, the size of a rigid electrophoretic display panel is different from that of a flexible electrophoretic display...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/167
Inventor 林育生辛哲宏陈万典吴淇铭
Owner E INK HLDG INC
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More